2013
DOI: 10.14233/ajchem.2013.11031
|View full text |Cite
|
Sign up to set email alerts
|

Effect of pH at Early Formed Structures in Cobalt Electrodeposition

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

0
4
0

Year Published

2016
2016
2024
2024

Publication Types

Select...
5

Relationship

0
5

Authors

Journals

citations
Cited by 6 publications
(4 citation statements)
references
References 18 publications
0
4
0
Order By: Relevance
“…catalyzed the oxidationo fa lcohol, [13] and copperm anganese oxide nanoparticles have been used for the oxidation of carbon monoxide, [14] alcohols, [15] and various hydrocarbons. [14,16] Similarly,M MOs containing manganese oxide along with those that are noble-metal doped/supported [16i, 17] are also used for the oxidation of benzyl alcohol.…”
Section: Introductionmentioning
confidence: 99%
“…catalyzed the oxidationo fa lcohol, [13] and copperm anganese oxide nanoparticles have been used for the oxidation of carbon monoxide, [14] alcohols, [15] and various hydrocarbons. [14,16] Similarly,M MOs containing manganese oxide along with those that are noble-metal doped/supported [16i, 17] are also used for the oxidation of benzyl alcohol.…”
Section: Introductionmentioning
confidence: 99%
“…The combination was subjected to electrodeposition of CoNPs from a solution of 0.1 M CoCl 2 , 1 M NaCl, and 0.5 M H 3 BO 3 (pH = 4) using cyclic voltammetry (CV) employing a potentiostat with a voltage scan window between 0.5 and −1.5 V for five cycles at a scan rate 20 mV/s. 36 The mask was removed from the electrode setup after deposition of the Co−MoS x material on Cu. The RE and CE were coated with Ag/AgCl ink and Ag ink, respectively, as they exhibit excellent temperature sensitivity.…”
Section: ■ Materials and Methodsmentioning
confidence: 99%
“…The connecting wire was soldered to the wire-connecting pad of the MoS x -coated WE. The combination was subjected to electrodeposition of CoNPs from a solution of 0.1 M CoCl 2 , 1 M NaCl, and 0.5 M H 3 BO 3 (pH = 4) using cyclic voltammetry (CV) employing a potentiostat with a voltage scan window between 0.5 and −1.5 V for five cycles at a scan rate 20 mV/s . The mask was removed from the electrode setup after deposition of the Co–MoS x material on Cu.…”
Section: Methodsmentioning
confidence: 99%
“…Therefore, previous researches on cobalt electrodeposition mainly focused on the cobalt structure, shape control, and deposition mechanism for the cobalt film on the plane substrate. [12][13][14][15][16][17][18][19][20][21][22][23][24][25][26][27][28] In contrast, in patterned areas such as interconnects, the purpose of the study is completely different, and research on the electrodeposition for feature filling using cobalt is insufficient.…”
mentioning
confidence: 99%