2002
DOI: 10.1016/s0022-3093(01)01140-1
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Effect of rf power on the properties of ITO thin films deposited by plasma enhanced reactive thermal evaporation on unheated polymer substrates

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Cited by 21 publications
(3 citation statements)
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“…The ATO–latex coatings in this study show a much higher conductivity at the same ATO loading than those made by Wang and Anderson,27 and this may be due to the use of different ATO particles and polymers. However, the conductivity of the ATO/PVAc‐ co ‐acrylic coatings prepared here is still much lower than that of vapor‐deposited13–15 or sol–gel‐processed16, 17 ITO coatings prepared at low temperatures.…”
Section: Resultsmentioning
confidence: 71%
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“…The ATO–latex coatings in this study show a much higher conductivity at the same ATO loading than those made by Wang and Anderson,27 and this may be due to the use of different ATO particles and polymers. However, the conductivity of the ATO/PVAc‐ co ‐acrylic coatings prepared here is still much lower than that of vapor‐deposited13–15 or sol–gel‐processed16, 17 ITO coatings prepared at low temperatures.…”
Section: Resultsmentioning
confidence: 71%
“…In particular, the processing conditions are not suitable for most polymers. Recently, progress has been made in lowering the processing temperature of ITO coatings so that the deposition of thermally evaporated,13, 14 ion‐plated,15 or silane‐bonded nanoparticle16, 17 ITO coatings on polymer substrates is possible. Another route to transparent conductive coatings on plastic substrates is to use composites composed of transparent conductive nanoparticles in a transparent polymer matrix.…”
Section: Introductionmentioning
confidence: 99%
“…6 To improve the J sc of SHJ solar cells while maintaining high fill factor, it is necessary to explore and develop TCO films with better optical and electrical properties. In the past decades, the ITO films have been grown by several deposition techniques, including direct current (DC) or radiofrequency sputtering, 7,8 thermal evaporation and electron beam evaporation, 9,10 plasma-enhanced reactive thermal evaporation, 11,12 pulsed laser deposition, 13,14 and reactive plasma deposition. 15 Among them, the sputtering process is currently the most widely used technique to deposit ITO films in mass production.…”
mentioning
confidence: 99%