The transition from strong to weak localization behavior was observed in two-dimensional Ge/Si quantum dot structure under the variation in the quantum dot occupancy, their areal density and annealing of the structures at 480-625°C. To clarify the carrier transport mechanism and separate the hopping and diffusive regimes, the temperature dependence of conductance and conductance nonlinearity were analyzed in the structures with different correlations between the disorder and interaction. It was shown that the change in the relative disorder without significantly changing the interaction keeps the system inside the one-parameter scaling. The role of the interaction in two-parameter scaling was revealed by observing the shift of Gell-Mann-Low scaling function for the samples with large variation in the Coulomb interaction.