2017
DOI: 10.1063/1.4977104
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Effect of sputtering power on crystallinity, intrinsic defects, and optical and electrical properties of Al-doped ZnO transparent conducting thin films for optoelectronic devices

Abstract: The crystallinity and intrinsic defects of transparent conducting oxide (TCO) films have a high impact on their optical and electrical properties and therefore on the performance of devices incorporating such films, including flat panel displays, electro-optical devices, and solar cells. The optical and electrical properties of TCO films can be modified by tailoring their deposition parameters, which makes proper understanding of these parameters crucial. Magnetron sputtering is the most adaptable method for p… Show more

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Cited by 45 publications
(18 citation statements)
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“…The increment of the optical band gap is attributed to the Burstein-Moss effects that results from the increase of the carrier concentration, while the optical band gap was renormalized by the Coulomb repulsion between the added holes in the valence band. A few studies reported that influence of RF power on bandgap is substantial to make a change of bandgap by 0.05 eV per 150 W RF power during growth of ZnO films [34]. Yet, the variation of Sn power in this work is relatively smaller than the previous work.…”
Section: Sample Labelcontrasting
confidence: 55%
“…The increment of the optical band gap is attributed to the Burstein-Moss effects that results from the increase of the carrier concentration, while the optical band gap was renormalized by the Coulomb repulsion between the added holes in the valence band. A few studies reported that influence of RF power on bandgap is substantial to make a change of bandgap by 0.05 eV per 150 W RF power during growth of ZnO films [34]. Yet, the variation of Sn power in this work is relatively smaller than the previous work.…”
Section: Sample Labelcontrasting
confidence: 55%
“…The tensile stress of layers composed of metallic materials has also been reported in a previous study ( 50 ). It has also been reported that a higher sputtering power can relieve in-plane compressive stress that enables the formation of layers with a higher degree of crystallinity ( 51 ). However, the stress did not decrease linearly as the Cr deposition power (and thereby, the thickness of the corresponding Cr nanolayers) increased.…”
Section: Resultsmentioning
confidence: 99%
“…Therefore, RF sputtering power significantly affects the switching characteristics and structural uniformity [203], [204] of ZnO-based transparent RRAM. Sputtering pressure also plays some vital roles in the fabrication of ZnO-based RRAM.…”
Section: Effect Of Deposition Parametersmentioning
confidence: 99%