2019
DOI: 10.1016/j.tsf.2018.11.005
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Effect of substrate bias and substrate/plasma generator distance on properties of a-C:H:SiOx films synthesized by PACVD

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Cited by 13 publications
(5 citation statements)
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“…The interaction between implants and the bodily fluid is strongly influenced by their surface properties, which directly affect various postimplant biological reactions, including precipitation of different minerals, protein adsorption, cell adhesion, and proliferation [ 38 ]. Bociaga et al [ 39 ] report that the optimum silicon content for exerting a positive effect on medical and biological properties is 10–14 at.%. A silicon content in the coating higher than 20 at.%, results in chemical and structural changes, reducing its biocompatibility.…”
Section: Resultsmentioning
confidence: 99%
“…The interaction between implants and the bodily fluid is strongly influenced by their surface properties, which directly affect various postimplant biological reactions, including precipitation of different minerals, protein adsorption, cell adhesion, and proliferation [ 38 ]. Bociaga et al [ 39 ] report that the optimum silicon content for exerting a positive effect on medical and biological properties is 10–14 at.%. A silicon content in the coating higher than 20 at.%, results in chemical and structural changes, reducing its biocompatibility.…”
Section: Resultsmentioning
confidence: 99%
“…The plasma-assisted chemical vapor deposition (PACVD) described in [28][29][30] was used to obtain a-C:H:SiO x films. The PACVD process was provided by the plasma generator with hot cathode.…”
Section: Preparation Of A-c:h:sio X Coatingsmentioning
confidence: 99%
“…Our previous research [28][29][30] reports on the effect from these parameters on different properties of the a-C:H:SiO x film. films can be provided through varying the deposition parameters such as process pressure, precursor consumption, discharge current, filament current, and substrate bias voltage.…”
Section: Preparation Of A-c:h:sio X Coatingsmentioning
confidence: 99%
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“…Контрольными образцами служили титановые образцы без a-C:H:SiO x покрытия (пять образцов Т1). Нанесение пленки происходило на вакуумной ионно-плазменной установке с технологическими параметрами осаждения, подробно описанными в [8].…”
Section: материалы и методыunclassified