2014
DOI: 10.1088/1757-899x/60/1/012058
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Effect of substrate temperature on structure and optical properties of Co3O4 films prepared by spray pyrolysis technique

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Cited by 21 publications
(11 citation statements)
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“…In all films the intensities of the recorded peaks are noticed to be week. Such small intensities of the diffraction peaks has been recorded before in our previous work [19,40]. The small peaks intensities could be attributed to the high cooling rate the films subjected to since all films are taken directly from the hot surface (450 o C) which gives a high rate of cooling since the film goes to room temperature in less than a minute.…”
Section: X-ray Diffraction and Microstructural Studysupporting
confidence: 60%
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“…In all films the intensities of the recorded peaks are noticed to be week. Such small intensities of the diffraction peaks has been recorded before in our previous work [19,40]. The small peaks intensities could be attributed to the high cooling rate the films subjected to since all films are taken directly from the hot surface (450 o C) which gives a high rate of cooling since the film goes to room temperature in less than a minute.…”
Section: X-ray Diffraction and Microstructural Studysupporting
confidence: 60%
“…That could be attributed to the difference in the measurement technique and the possible agglomeration in the film during deposition. In our previous work on Co3O4 [40] agglomeration phenomena were observed and discussed.…”
Section: X-ray Diffraction and Microstructural Studymentioning
confidence: 94%
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“…The total reaction occurs rapidly with the generation of micronano structured products (Figure a). The aerosol speed, liquid reactant concentrations, gas pressure, and calcination temperature will influence the final products. For example, with a 0.3 M Co­(NO 3 ) 2 ·6H 2 O aqueous solution as the reactant, Co 3 O 4 could be prepared with an air pressure of 2–3 atm, a flow rate of 3–4 cm 3 /min, and a temperature of 350 °C . Usually, the spray pyrolysis products are directly deposited on conductive substrates such as gold, conductive glass, and Ti , and applied as catalysts for reactions such as oxygen reduction and ethylene glycol oxidation.…”
Section: Preparationmentioning
confidence: 99%
“…24 Co 3 O 4 has also demonstrated resistive switching properties, which are important regarding its potential applications in RRAM devices. 25,26 Co 3 O 4 and ZrO 2 oxides may be grown using different physical and chemical techniques, such as solution spray pyrolysis, [27][28][29] chemical vapor deposition, [30][31][32][33] pulsed laser deposition, 34,35 solgel, 36,37 electron-beam evaporation, 38,39 or, atomic layer deposition (ALD). [40][41][42][43][44][45][46] Herewith, ALD may be regarded as the ultimate method providing the most precise thickness control over large substrate areas.…”
mentioning
confidence: 99%