Effect of substrate temperature on the structural, electrical, and optical properties of GZO/ZnO films deposited by radio frequency magnetron sputtering

Kim, Sun-Kyung; Kim, Seung-Hong; Kim, Soyoung; Jeon, Jae-Hyun; Gong, Tae-Kyung; Choi, Dong‐Hyuk; Son, Donghoon; Kim, Daeil

doi:10.1016/j.ceramint.2013.11.127

Cited by 16 publications

(4 citation statements)

References 8 publications

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“…The grain sizes of the Ag interlayer films were considered with the Scherrer relation and by observing the full width at half maximum (FWHM) of the Ag (111) diffraction peak from Fig. 1 [7]. The ZTO films with 15 nm and 20 nm thick Ag interlayer showed grain sizes of 10 nm and 12 nm, respectively.…”

Section: Resultsmentioning

confidence: 99%

Influence of the Ag interlayer on the structural, optical, and electrical properties of ZTO/Ag/ ZTO films

Gong¹,

Moon²,

Kim³

2016

Transactions on Electrical and Electronic Materials

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ZnSnO 3 (ZTO)/Ag/ ZnSnO 3 (ZTO) trilayer films were prepared on glass substrates by radio frequency (RF) and direct current (DC) magnetron sputtering. The electrical resistivity and optical transmittance of the films were investigated as a function of the Ag interlayer thickness. ZTO films with a 15 nm thick Ag interlayer show the highest average visible transmittance (83.2%) in the visible range. In this study, the highest figure of merit (2.1×10 -2 Ω cm) is obtained with the ZTO 50 nm/Ag 15 nm/ZTO 50 nm films.The enhanced optical and electrical properties of ZTO films with a 15 nm thick Ag interlayer are attributed to the crystallization of the Ag interlayer, as supported by the distinct XRD pattern of the Ag (111) peaks. From the observed results, higher optical and electrical performance of the ZTO film with a 15 nm thick Ag interlayer seems to make a promising alternative to conventional transparent conductive ITO films.

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Section: Resultsmentioning

confidence: 99%

Influence of the Ag interlayer on the structural, optical, and electrical properties of ZTO/Ag/ ZTO films

Gong¹,

Moon²,

Kim³

2016

Transactions on Electrical and Electronic Materials

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“…11 In order to achieve high-quality indium gallium zinc oxide (IGZO) films through magnetron sputtering, the IGZO target must possess a high level of purity, density, and a uniform fine structure. 12,13 The conventional techniques employed for the preparation of ceramic targets typically involve stamping, molding, hot isostatic pressing, and cold isostatic pressing (CIP). [14][15][16][17] The density and sintering activity of green compacts, which are formed through molding and CIP, exhibit variations depending on the applied pressure.…”

Section: Introductionmentioning

confidence: 99%

Investigate the relationship between densification and grain size of IGZO target by phase‐field simulation

Liu,

Sun,

Zhang

et al. 2024

J Am Ceram Soc.

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The phase‐field method was employed to simulate the effects of pores on grain growth in the indium gallium zinc oxide (IGZO) targets during conventional and two‐stage sintering (TSS). The findings indicated that the TSS method effectively suppressed the rapid growth of grains. With an increase in porosity and a more prominent pore size, the rate of grain growth accelerated, resulting in the formation of coarser grains. Subsequently, IGZO targets were fabricated using the molding‐cold isostatic pressing (CIP) and TSS methods. The densification activation energies of IGZO green compacts were calculated to be 510 and 370 kJ/mol for CIP at 180 and 250 MPa, respectively, utilizing the main sintering curve (MSC). Additionally, by optimizing the TSS process, a highly dense IGZO target with a relative density of 99.53%, a resistivity of 4.3 mΩ/cm, and an average grain size of 8.59 µm was successfully achieved.

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“…However, such high substrate temperatures prevent the use of polymer substrates for flexible displays. Thus, GZO/Ag/GZO trilayer films [5], GZO/Cu [6], and GZO/ZnO bi-layered films [7] were developed to enhance the optical and electrical properties of GZO films without associated substrate heating.…”

Section: Introductionmentioning

confidence: 99%

Influence of a Ni interlayer on the optical and electrical properties of trilayer GZO/Ni/GZO films

Heo

Jeon

Gong

et al. 2015

Ceramics International

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Effect of substrate temperature on the structural, electrical, and optical properties of GZO/ZnO films deposited by radio frequency magnetron sputtering

Cited by 16 publications

References 8 publications

Influence of the Ag interlayer on the structural, optical, and electrical properties of ZTO/Ag/ ZTO films

Influence of the Ag interlayer on the structural, optical, and electrical properties of ZTO/Ag/ ZTO films

Investigate the relationship between densification and grain size of IGZO target by phase‐field simulation

Influence of a Ni interlayer on the optical and electrical properties of trilayer GZO/Ni/GZO films

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