Effect of Substrates on Structural Properties of Pure Anatase Phase Titanium Dioxide Thin Films Prepared by Mist Chemical Vapor Deposition

Zhang, Qiang; Li, Chaoyang

doi:10.1149/2.0191811jss

Cited by 8 publications

(5 citation statements)

References 32 publications

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“…According to our previous research, mist chemical vapor deposition (mist CVD) method was found to have specific advantages in terms of precise growth controllability, large area deposition and simplicity to synthesize TiO 2 thin films [23,24]. In this research, the mist CVD method was used to synthesize TiO 2 thin film, and the thermal stability of obtained TiO 2 films was investigated.…”

Section: Introductionmentioning

confidence: 99%

High Temperature Stable Anatase Phase Titanium Dioxide Films Synthesized by Mist Chemical Vapor Deposition

Zhang

2020

Nanomaterials

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Pure anatase-phase titanium dioxide films stable up to high temperatures were successfully fabricated by the mist chemical vapor deposition method. A post-annealing treatment of the synthesized films was carried out in oxygen atmosphere in the temperature range from 600 to 1100 °C and no anatase to rutile transformation was observed up to 1000 °C. Based on the grazing incidence X-ray diffraction data, the average crystallite size of the titanium dioxide films increased gradually with increasing annealing temperature. The structural analysis revealed that the high thermal stability of the anatase phase can be attributed to the small crystallite size and a sheet-like grain structure. An incomplete anatase to rutile transformation was observed after annealing at 1100 °C.

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Section: Introductionmentioning

confidence: 99%

High Temperature Stable Anatase Phase Titanium Dioxide Films Synthesized by Mist Chemical Vapor Deposition

Zhang

2020

Nanomaterials

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“…In our previous research, we had successfully used the mist CVD method to fabricate the TiO 2 film [38,39]. In this research, we planned to apply the mist CVD method to synthesize aluminum-doped ZnO (AZO) thin film.…”

Section: Introductionmentioning

confidence: 99%

Effect of Aluminum Doping Ratios on the Properties of Aluminum-Doped Zinc Oxide Films Deposited by Mist Chemical Vapor Deposition Method Applying for Photocatalysis

Wai

2022

Nanomaterials

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Aluminum-doped zinc oxide film was deposited on a glass substrate by mist chemical vapor deposition method. The influence of different aluminum doping ratios on the structural and optical properties of zinc oxide film was investigated. The XRD results revealed that the diffraction peak of (101) crystal plane was the dominant peak for the deposited AZO films with the Al doping ratios increasing from 1 wt % to 3 wt %. It was found that the variation of AZO film structures was strongly dependent on the Al/Zn ratios. The intertwined nanosheet structures were obtained when Zn/O ratios were greater than Al/O ratios with the deposition temperature of 400 °C. The optical transmittance of all AZO films was greater than 80% in the visible region. The AZO film deposited with Al doping ratio of 2 wt % showed the highest photocatalytic efficiency between the wavelength of 475 nm and 700 nm, with the high first-order reaction rate of 0.004 min−1 under ultraviolet radiation. The mechanism of the AZO film influenced by aluminum doping ratio during mist chemical vapor deposition process was revealed.

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“…Until now, there were still critical issues on the synthesizing methods to obtain the stable pure anatase of TiO 2 thin films. According to our previous research (7,8), we had successfully fabricated the pure anatase phase TiO 2 thin films by using the mist chemical vapor deposition (CVD) method. In order to further use pure anatase TiO 2 films for photocatalytic applications, the influence of different substrates and temperature on the synthesizing of pure anatase TiO 2 thin films were investigated in this research.…”

Section: Introductionmentioning

confidence: 99%

(Invited) Pure Anatase Phase Titanium Dioxide Thin Films Prepared by Mist Chemical Vapor Deposition Applying for Photocatalysis

Li¹,

Takeda²,

Wai³

2021

ECS Trans.

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Pure anatase TiO 2 thin films were successfully deposited on five kind of substrates including p-type silicon, AZO, ITO, glass, and quartz class substrates by mist CVD method. The deposited temperature to get the pure anatase TiO 2 thin film was optimized at 400°C. The intertwined nanosheets structure of TiO 2 thin films with uniformity were observed on all of different substrates. The deposited TiO 2 thin films on five kind of substrates could be confirmed that the pure anatase TiO 2 with the same dominant peak of ( 101) and crystallinity was significantly improved in order of ptype silicon, AZO, ITO, glass, and quartz glass substrates. The transmittance of TiO 2 films on transparent substrates showed the high transmittance of over 65% in visible region. The pure anatase TiO 2 film on AZO substrate with lowest roughness had the greater potential to apply in photocatalytic applications

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Effect of Substrates on Structural Properties of Pure Anatase Phase Titanium Dioxide Thin Films Prepared by Mist Chemical Vapor Deposition

Cited by 8 publications

References 32 publications

High Temperature Stable Anatase Phase Titanium Dioxide Films Synthesized by Mist Chemical Vapor Deposition

High Temperature Stable Anatase Phase Titanium Dioxide Films Synthesized by Mist Chemical Vapor Deposition

Effect of Aluminum Doping Ratios on the Properties of Aluminum-Doped Zinc Oxide Films Deposited by Mist Chemical Vapor Deposition Method Applying for Photocatalysis

(Invited) Pure Anatase Phase Titanium Dioxide Thin Films Prepared by Mist Chemical Vapor Deposition Applying for Photocatalysis

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