2016
DOI: 10.1016/j.surfcoat.2016.03.044
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Effect of Ta underlayer on magnetic properties of FeMn/NiFe films

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Cited by 12 publications
(4 citation statements)
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“…A constant magnetic field H dep = 1.5 kOe was applied during deposition in order to define an in-plane EB axis. Tantalum underlayer was used to induce a (111) FeMn preferential growth [24,25]. Magnetic characterization was performed at room temperature using a homemade alternating gradientfield magnetometer (AGFM).…”
Section: Methodsmentioning
confidence: 99%
“…A constant magnetic field H dep = 1.5 kOe was applied during deposition in order to define an in-plane EB axis. Tantalum underlayer was used to induce a (111) FeMn preferential growth [24,25]. Magnetic characterization was performed at room temperature using a homemade alternating gradientfield magnetometer (AGFM).…”
Section: Methodsmentioning
confidence: 99%
“…An amazing feature of these structures is a relatively strong temperature dependence of exchange bias [64]. As an example, very high ratios of exchange bias to easy axis coercivity H B /H C ∼ 10 at room temperature have been reported for (111)-textured NiFe/IrMn [65] and NiFe/FeMn [66] exchange-biased bilayer systems.…”
Section: Introductionmentioning
confidence: 99%
“…Since EB is an interface phenomenon, roughness, morphology, crystallinity, thickness, and grain size of both AF and FM layer are highly sensitive to EB field (H E ), the magnetic field strength where the center of the M-H loop of a FM layer adjacent to an AF layer is shifted. [16][17][18][19] Therefore, microstructure and interface control is essential to optimize H E . Of all studied exchange bias system, underlayering has been reported effective on improving both interfacial property and crystallinity of AF and FM layers.…”
Section: Introductionmentioning
confidence: 99%
“…Of all studied exchange bias system, underlayering has been reported effective on improving both interfacial property and crystallinity of AF and FM layers. [16][17][18][19] In this work, Ta, reported effective to produce smooth interface with improved crystallinity, 19 is adopted as an underlayer, and the effect of post thermal process on ordering phase transformation, microstructure, and EB field of Co/MnPt (MnPt at bottom of bilayer) and MnPt/Co (MnPt at top of the bilayer) bilayers on Ta underlayer are studied. Large H E in the range of 465-560 Oe are attained in two above series films through proper thermal process of post annealing and cooling in external magnetic field.…”
Section: Introductionmentioning
confidence: 99%