Effect of target–substrate distance onto the nanostructured rhodium thin films via PLD technique

Mostako, A.T.T.; Khare, Alika

doi:10.1007/s13204-012-0081-0

Cited by 13 publications

(3 citation statements)

References 15 publications

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“…In order to minimize the density of dot-like features on the film surface, d has been progressively increased from 6.8 to 7.5 cm over the sample's series. As d is increased, the growth rate of the film decreases [35]. The reduction in growth rate favors the uniform arrangement of the ablated incoming species, until the step flow growth regime is stabilized.…”

Section: Scanning Tunneling Microscopymentioning

confidence: 98%

Direct-ARPES and STM Investigation of FeSe Thin Film Growth by Nd:YAG Laser

et al. 2021

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Research on ultrathin quantum materials requires full control of the growth and surface quality of the specimens in order to perform experiments on their atomic structure and electron states leading to ultimate analysis of their intrinsic properties. We report results on epitaxial FeSe thin films grown by pulsed laser deposition (PLD) on CaF2 (001) substrates as obtained by exploiting the advantages of an all-in-situ ultra-high vacuum (UHV) laboratory allowing for direct high-resolution surface analysis by scanning tunnelling microscopy (STM), synchrotron radiation X-ray photoelectron spectroscopy (XPS) and angle-resolved photoemission spectroscopy (ARPES) on fresh surfaces. FeSe PLD growth protocols were fine-tuned by optimizing target-to-substrate distance d and ablation frequency, atomically flat terraces with unit-cell step heights are obtained, overcoming the spiral morphology often observed by others. In-situ ARPES with linearly polarized horizontal and vertical radiation shows hole-like and electron-like pockets at the Γ and M points of the Fermi surface, consistent with previous observations on cleaved single crystal surfaces. The control achieved in growing quantum materials with volatile elements such as Se by in-situ PLD makes it possible to address the fine analysis of the surfaces by in-situ ARPES and XPS. The study opens wide avenues for the PLD based heterostructures as work-bench for the understanding of proximity-driven effects and for the development of prospective devices based on combinations of quantum materials.

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Section: Scanning Tunneling Microscopymentioning

confidence: 98%

Direct-ARPES and STM Investigation of FeSe Thin Film Growth by Nd:YAG Laser

et al. 2021

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“…But also, the samples' quality depends on other experimental conditions, such as target nature (stoichiometry), target-substrate distance, gas pressure, gas environment, deposition time, and substrate temperature (ST) (Blue et al, 2018). The roughness and thickness of the deposited film are affected by the spherical expansion of the plasma plume induced by the laser, which depends on the target-substrate distance, as the sample growth rate increases as the target-substrate distance decrease (Mostako & Khare, 2012).…”

Section: Introductionmentioning

confidence: 99%

Research in Basic Sciences: Results of some math and physics projects

Landázuri¹,

Vargas²,

Zapata³

et al. 2022

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Desde nuestra Facultad se presentan trabajos resultados de investigación que le aportan ignificativamente a las aplicaciones de las ciencias básicas y que son el resultado del compromiso y la dedicación de nuestros docentes investigadores, quienes trabajan para abordar problemas complejos y generar soluciones innovadoras y sostenibles. En el primer capítulo se presenta un estudio de las propiedades en nuevos materiales, en este caso del crecimiento de películas delgadas de grafeno en sustrato de silicio utilizando el método de deposición por láser pulsado (DLP) donde se utilizaron 6 técnicas de caracterización (Espectroscopía Raman, IRTF, MEB, SED, MFA, MACA) y como conclusión se tiene que las muestras similares al grafeno presentan propiedades de hidrofobicidad y las muestras de carbono amorfo tienen propiedades hidrofílicas. En el segundo capítulo se presenta un modelamiento matemático y una discusión sobre la existencia de soluciones de segunda clase en una ecuación de Tricomi, se plantea la existencia de soluciones periódicas de una generalización de la ecuación de Tricomi, el estudio se realiza mediante métodos perturbativos; de igual forma, se usa la función de Melnikov para encontrar las condiciones bajo las cuales se conservan las curvas homoclínicas. En el tercer capítulo se plantea una metodología de enseñanza-aprendizaje para enseñar la geometría descriptiva básica y la resolución de problemas a través del software Autocad.

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“…The expansion of the laser-induced plasma plume increases with . This reduces the particle flux of the target species over the substrate area, which lowers the deposition rate and the thickness [14]. Moreover, for a single film, the particle flux reaching the substrate also decreases with increasing the radial angle with respect to the normal to the substrate.…”

mentioning

confidence: 99%

Structural Characterization and Thickness Profile of Pulsed Laser-Deposited KY3F10: Ho3+ Thin Films

Gemechu

Abebe

2018

Ukr. J. Phys.

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Thin films of KY3F10 : Ho3+ have been successfully prepared by the pulsed laser deposition with a Nd-YAG laser (266 nm, pulse duration of 10 ns, repetition rate of 2 Hz) on a 1 cm × 1 cm silicon substrate in vacuum and for different target-to-substrate distances. The X-ray diffraction (XRD) results show that the films crystallized in the tetragonal polycrystalline phase of KY3F10 (in agreement with JCPDS card No. 27-0465). Theoretical predictions of the thickness profile have been presented, by using some experimental parameters used in the deposition. Assuming the ellipsoidal expansion of the plasma plume, the thickness profiles of films have been estimated from the solution of the gas dynamical equations for the adiabatic expansion of the plasma plume into vacuum. The results show the strong forward direction of the plume and are in a good agreement with experimental results. Both theoretical and experimental results show a decrease in the film thickness for relatively larger values of the target-to-substrate distance, and this could be attributed to a decrease in the deposition rate at such larger distances. Moreover, for a single film, the thickness also decreases for relatively larger radial angles with respect to the normal to the substrate. K e y w o r d s: thickness profile, gas dynamic equations, plasma plume. IntroductionPulsed laser deposition (PLD) is a thin film deposition technique, which has been a popular, versatile, and highly flexible method for the thin film growth for various materials [1][2][3]. Using this technique, the advantage of controlling a thin film stoichiometry accurately can be achieved by controlling the deposition parameters. The expansion of a laser-induced plasma plume increases on its way from the target to the substrate. This varies the particle flux of the target species over the substrate area, which makes the different parts of the same film to have slightly different thicknesses. It is reported that, near the axis of the plasma plume, the angular distribution of the flux species is proportional to cos , where ≫ 1 and is the radial angle with respect to the normal to the substrate [4]. The cause for this strong forward direction is the strong differences in pressure gradients in axial and radial directions. R.K. Singh and J. Narayan investigated the problem of the angular distribution of the mass flow in the plasma expansion, c ○ N. GEMECHU, T. ABEBE, 2018 by using the isothermal solution of the following gas dynamical equations with Gaussian pressure and density profiles [5]:where , , , and are the density, pressure, velocity, and entropy, respectively. However, since there exists a considerable temperature gradient inside the plasma plume [4,6], the consideration of isothermal solutions is inadequate for the description of PLD. S.I. Anisimov et al. considered the adiabatic expansion of a plume, which is a more realistic situation [4] and described the ellipsoidal expansion of a plasma plume in to vacuum by the above gas dynamic equations as well. By assuming that the...

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Effect of target–substrate distance onto the nanostructured rhodium thin films via PLD technique

Cited by 13 publications

References 15 publications

Direct-ARPES and STM Investigation of FeSe Thin Film Growth by Nd:YAG Laser

Direct-ARPES and STM Investigation of FeSe Thin Film Growth by Nd:YAG Laser

Research in Basic Sciences: Results of some math and physics projects

Structural Characterization and Thickness Profile of Pulsed Laser-Deposited KY3F10: Ho3+ Thin Films

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