2018
DOI: 10.1088/1757-899x/423/1/012133
|View full text |Cite
|
Sign up to set email alerts
|

Effect of Temperature on Dephosphorization of Ferrosilicon using Electromagnetic Levitation Technology under Vacuum

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2021
2021
2021
2021

Publication Types

Select...
1

Relationship

0
1

Authors

Journals

citations
Cited by 1 publication
(1 citation statement)
references
References 5 publications
0
1
0
Order By: Relevance
“…Le et al [22] studied the kinetics of phosphorus removal from metallurgical grade silicon by means of chemical reactions under EML conditions. Shi et al [23] investigated the effect of temperature on dephosphorization of ferrosilicon. Recent work has reported on the kinetic aspects of phosphorus removal from metallurgical grade silicon by evaporation under EML conditions [24].…”
Section: Introductionmentioning
confidence: 99%
“…Le et al [22] studied the kinetics of phosphorus removal from metallurgical grade silicon by means of chemical reactions under EML conditions. Shi et al [23] investigated the effect of temperature on dephosphorization of ferrosilicon. Recent work has reported on the kinetic aspects of phosphorus removal from metallurgical grade silicon by evaporation under EML conditions [24].…”
Section: Introductionmentioning
confidence: 99%