Effect of the aromatic precursor flow rate on the morphology and properties of carbon nanostructures in plasma enhanced chemical vapor deposition

Lehmann, Karsten; Yurchenko, Olena; Urban, G.

doi:10.1039/c6ra02999j

Cited by 16 publications

(12 citation statements)

References 64 publications

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“…Carbon-containing aromatic compounds were also successfully employed for the large-scale growth of CNWs. Lehmann et al described the growth of CNWs using paraxylene as the precursor in an RF–ICP system [ 57 ]. The morphology of carbon nanostructure changes from nanofibers, nanowalls to interconnected nanowalls concerning the flow rate decreases from 5 mL/h to 0.5 mL/h.…”

Section: Plasma: Potential Approach For Carbon Nanowall (Cnw) Syntmentioning

confidence: 99%

“…Lehmann et al described the effect of the flow rate of the aromatic precursor on the growth of CNWs [ 57 ]. Aromatic paraxylene (P-xylene) was inserted to an RFICP system as the precursor.…”

Section: Influence Of Gas Sources and Gas Proportionmentioning

confidence: 99%

“… SEM images of ( a ) a tilted view of carbon nanofibers (CNF) and a top view of ( b ) freestanding CNW and ( c ) interconnected CNW. Reproduced with permission from [ 57 ]. Copyright Royal Society of Chemistry 2016.…”

Section: Figurementioning

confidence: 99%

See 2 more Smart Citations

Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges

et al. 2018

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Carbon, one of the most abundant materials, is very attractive for many applications because it exists in a variety of forms based on dimensions, such as zero-dimensional (0D), one-dimensional (1D), two-dimensional (2D), and-three dimensional (3D). Carbon nanowall (CNW) is a vertically-oriented 2D form of a graphene-like structure with open boundaries, sharp edges, nonstacking morphology, large interlayer spacing, and a huge surface area. Plasma-enhanced chemical vapor deposition (PECVD) is widely used for the large-scale synthesis and functionalization of carbon nanowalls (CNWs) with different types of plasma activation. Plasma-enhanced techniques open up possibilities to improve the structure and morphology of CNWs by controlling the plasma discharge parameters. Plasma-assisted surface treatment on CNWs improves their stability against structural degradation and surface chemistry with enhanced electrical and chemical properties. These advantages broaden the applications of CNWs in electrochemical energy storage devices, catalysis, and electronic devices and sensing devices to extremely thin black body coatings. However, the controlled growth of CNWs for specific applications remains a challenge. In these aspects, this review discusses the growth of CNWs using different plasma activation, the influence of various plasma-discharge parameters, and plasma-assisted surface treatment techniques for tailoring the properties of CNWs. The challenges and possibilities of CNW-related research are also discussed.

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Section: Plasma: Potential Approach For Carbon Nanowall (Cnw) Syntmentioning

confidence: 99%

Section: Influence Of Gas Sources and Gas Proportionmentioning

confidence: 99%

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Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges

et al. 2018

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“…Currently, it is supposed that C 2 dimers are the most important building units for CNWs growth [23]. From C 2 dimers, higher mass-carbon clusters C n H x + may be formed, initiating the growth process [23,24]. In fact, we have found only one publication, published by Lehman et al [24], where authors used aromatic precursor p-xylene for the synthesis of CNWs.…”

Section: Influence Of the Polymer Materials As A Carbon Atom Sourcementioning

confidence: 99%

Comparison of Plasma Deposition of Carbon Nanomaterials Using Various Polymer Materials as a Carbon Atom Source

et al. 2022

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Carbon nanowalls are promising materials for various electrochemical devices due to their chemical inertness, desirable electrical conductivity, and excellent surface-to-mass ratio. Standard techniques, often based on plasma-assisted deposition using gaseous precursors, enable the synthesis of top-quality carbon nanowalls, but require long deposition times which represents a serious obstacle for mass applications. Here, an alternative deposition technique is presented. The carbon nanowalls were synthesized on titanium substrates using various polymers as solid precursors. A solid precursor and the substrate were mounted into a low-pressure plasma reactor. Plasma was sustained by an inductively coupled radiofrequency discharge in the H-mode at the power of 500 W. Spontaneous growth of carbon nanomaterials was observed for a variety of polymer precursors. The best quality of carbon nanowalls was obtained using aliphatic polyolefins. The highest growth rate of a thin film of carbon nanowalls of about 200 nm/s was observed. The results were explained by different degradation mechanisms of polymers upon plasma treatment and the surface kinetics.

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“…CNWs were observed only if H 2 was added, whereas formation of nanofibers was observed if CO was mixed with Ar/O 2 [21]. In recent years, CNWs were also successfully synthesized by using other precursors like organic precursor (p-xylene [22], ethanol or hexane [23,24]) or metal-organic precursors (aluminum acetylacetonate [25]).…”

Section: Introductionmentioning

confidence: 99%

Synthesis of Vertically Oriented Graphene Sheets or Carbon Nanowalls—Review and Challenges

et al. 2019

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The paper presents a review on the current methods for deposition of vertically oriented multilayer graphene sheets (often called carbon nanowalls—CNWs) on solid substrates. Thin films of CNWs are among the most promising materials for future applications in capacitors, batteries, electrochemical devices, and photovoltaics, but their application is currently limited by slow deposition rates and difficulties in providing materials of a desired structure and morphology. The review paper analyzes results obtained by various groups and draws correlations between the reported experimental conditions and obtained results. Challenges in this scientific field are presented and technological problems stressed. The key scientific challenge is providing the growth rate as well as morphological and structural properties of CNWs thin films versus plasma parameters, in particular versus the fluxes of reactive plasma species onto the substrate surface. The technological challenge is upgrading of deposition techniques to large surfaces and fast deposition rates, and development of a system for deposition of CNWs in the continuous mode.

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Effect of the aromatic precursor flow rate on the morphology and properties of carbon nanostructures in plasma enhanced chemical vapor deposition

Abstract: Understanding the effects of the synthesis parameters on the morphology and electrochemical properties of nanocarbon layers is a key step in the development of application-tailored nanostructures.

Cited by 16 publications

References 64 publications

Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges

Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges

Comparison of Plasma Deposition of Carbon Nanomaterials Using Various Polymer Materials as a Carbon Atom Source

Synthesis of Vertically Oriented Graphene Sheets or Carbon Nanowalls—Review and Challenges

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