2022
DOI: 10.1007/s10854-022-08578-y
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Effect of thermal annealing on the structural and optical properties of black silicon

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Cited by 20 publications
(28 citation statements)
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“…Morphological changes of the b‐Si layer during thermal annealing are explained by the combined action of two processes: sintering and the consumption of b‐Si due to the formation of the oxide. [ 25 ] In our experiments, the latter process is dominant. The b‐Si oxidation rate is large enough due to the large active surface area (the nanoneedles are oxidized on all sides).…”
Section: Resultsmentioning
confidence: 72%
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“…Morphological changes of the b‐Si layer during thermal annealing are explained by the combined action of two processes: sintering and the consumption of b‐Si due to the formation of the oxide. [ 25 ] In our experiments, the latter process is dominant. The b‐Si oxidation rate is large enough due to the large active surface area (the nanoneedles are oxidized on all sides).…”
Section: Resultsmentioning
confidence: 72%
“…The average valley‐to‐peak height, base diameter, and in‐plane periodicity of the b‐Si needles were 640, 100, and 150 nm, respectively. [ 25 ]…”
Section: Methodsmentioning
confidence: 99%
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