2006
DOI: 10.1016/j.apsusc.2006.03.014
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Effect of thickness on the structure, morphology and optical properties of sputter deposited Nb 2 O 5 films

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Cited by 67 publications
(36 citation statements)
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“…At the same wavelength, the k of the films changes from 1.05 9 10 -3 for the thickest film to 0.75 9 10 -3 for the thinnest film as shown in Table 1. The increase of the film t for crystalline film will increase the optical scattering and optical loss [29], which induces the increase of k.…”
Section: Optical Propertiesmentioning
confidence: 99%
“…At the same wavelength, the k of the films changes from 1.05 9 10 -3 for the thickest film to 0.75 9 10 -3 for the thinnest film as shown in Table 1. The increase of the film t for crystalline film will increase the optical scattering and optical loss [29], which induces the increase of k.…”
Section: Optical Propertiesmentioning
confidence: 99%
“…The temperature of the film increases in the heating process, which will enhance the mobility of molecules or ions in the film. The movement of molecules or ions may induce the crystallization and the variation of surface morphology of the film [19]. The crystallite size and surface roughness are shown in Table 1.…”
Section: Resultsmentioning
confidence: 99%
“…Particularly, the high index of refraction, which is related to a high dielectric permittivity, and the wide band gap, which is related to a low dielectric loss, favor the niobium pentoxide for use as a dielectric material for capacitor technology and for the use as a transparent material in optical systems [4]. The niobium pentoxide has been extensively studied as a gate dielectric for complementary metal oxide semiconductor (CMOS) devices [5] and is in particular a very interesting candidate for nonvolatile memories based on resistive switching [6][7][8].…”
Section: Introductionmentioning
confidence: 99%