2017
DOI: 10.1007/s10854-017-6943-1
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Effect of thickness on the physical properties and gas sensing application: anatase titanium dioxide nanofilms by automated nebulizer spray pyrolysis (ANSP)

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Cited by 8 publications
(4 citation statements)
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“…The AFM is a valuable tool for obtaining microscopic information about surface structures and generating topographical representations of surface relief. This technique provides digital images that enable quantitative measurements of surface features, including root mean square roughness (RMS), average roughness, and three-dimensional simulations from various perspectives [54].…”
Section: Afmmentioning
confidence: 99%
“…The AFM is a valuable tool for obtaining microscopic information about surface structures and generating topographical representations of surface relief. This technique provides digital images that enable quantitative measurements of surface features, including root mean square roughness (RMS), average roughness, and three-dimensional simulations from various perspectives [54].…”
Section: Afmmentioning
confidence: 99%
“…The properties of TiO 2 NRs depend mainly on the preparative method and its respective parameters. Numerous synthetic techniques, such as sol-gel, hydrothermal, electron beam evaporation, and spray pyrolysis, have been utilized to construct TiO 2 NRs [ 17 , 18 , 19 , 20 ]. Among them, hydrothermal technique is a powerful low-temperature method with inexpensive mass production of TiO 2 NRs.…”
Section: Introductionmentioning
confidence: 99%
“…Until now, it is still strict issue to obtain pure anatase phase TiO 2 with good uniformity and high crystallinity using current synthesis methods. [15][16][17][18][19][20][21][22][23][24][25] Particularly, it is difficult to fabricate anatase phase TiO 2 thin films with good crystallinity by spray pyrolysis, conventional chemical vapor deposition, atomic layer deposition or high vacuum chemical vapor deposition. When these methods are applied with a low deposition temperature (not higher than 350 • C), the deposition of anatase phased TiO 2 film is kinetically controlled, 1 which means the growth of anatase phased TiO 2 film is limited by low decomposition rate of precursor.…”
mentioning
confidence: 99%
“…[21][22][23] When deposition temperature is increased, the deposition will become controlled by mass transport, 1 and the growth of anatase phased TiO 2 film is limited by the lack of precursor, resulting in a poor thickness uniformity of deposited TiO 2 film. [23][24][25] In order to fabricate pure anatase phase TiO 2 film with good uniformity and high crystallinity, it is necessary to develop a novel synthesis method. According to our previous research experience, we found the mist chemical vapor deposition (mist CVD), 26 as shown in Fig.…”
mentioning
confidence: 99%