2020
DOI: 10.21272/jnep.12(1).01007
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Effect of Top Electrode Materials on Switching Characteristics and Endurance Properties of Zinc Oxide Based RRAM Device

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Cited by 4 publications
(4 citation statements)
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“…In this review, we will present RRAM-related inorganic materials with oxides, solid electrolyte and two-dimensional (2D) materials. [9,20,75], NiO [8,12,76], TiO 2 [21,77,78], HfO 2 [60,79,80], ZnO [81][82][83], and ZrO 2 [22,84,85] are always playing main roles in materials application of RS medium. The first report of RS performance in binary metal oxides was proposed by Hickmott in 1962 [91], which demonstrated the RS characteristics of Al/Al 2 O 3 /Al device under the effect of an electric field.…”
Section: Thin Film Materials Of Rs Mediummentioning
confidence: 99%
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“…In this review, we will present RRAM-related inorganic materials with oxides, solid electrolyte and two-dimensional (2D) materials. [9,20,75], NiO [8,12,76], TiO 2 [21,77,78], HfO 2 [60,79,80], ZnO [81][82][83], and ZrO 2 [22,84,85] are always playing main roles in materials application of RS medium. The first report of RS performance in binary metal oxides was proposed by Hickmott in 1962 [91], which demonstrated the RS characteristics of Al/Al 2 O 3 /Al device under the effect of an electric field.…”
Section: Thin Film Materials Of Rs Mediummentioning
confidence: 99%
“…As one of the most typical representatives of oxides, binary oxides have been explored for over half a century due to their simple composition, low manufacture cost, compatibility with traditional CMOS (complementary metal-oxide-semiconductor transistor) technology, and ease of fabrication and control. Among binary oxides, binary metal oxides such as Al 2 O 3 [ 9 , 20 , 75 ], NiO [ 8 , 12 , 76 ], TiO 2 [ 21 , 77 , 78 ], HfO 2 [ 60 , 79 , 80 ], ZnO [ 81 , 82 , 83 ], and ZrO 2 [ 22 , 84 , 85 ] are always playing main roles in materials application of RS medium.…”
Section: Thin Film Materials Of Rram Devicesmentioning
confidence: 99%
“…2. SIMNRA is mainly intended for the simulation of spectra with non-Rutherford backscattering cross-sections The SIMNRA simulation [15][16][17][18][19] is used to fit the spectrum and to determine the thickness of the film and zinc, oxygen atomic fraction. From the SIMNRA simulation, the zinc atomic fractions were estimated to be 60.0% and oxygen 40.0 % and Zinc oxide film thickness of 140 ± 10 nm.…”
Section: Resultsmentioning
confidence: 99%
“…As grown substrate was characterized for the surface characterization properties showing uniform and crack-free deposition of ZnO. 15,16 Gold 200 Å thick was placed by DC sputtering using a shadow mask. Before gold is deposited, a coating of titanium (15 nm) is deposited to make the gold more adherent to the annealed oxide layer.…”
Section: Methodsmentioning
confidence: 99%