“…In order to obtain better performance in various optoelectronic and photodetection applications many researchers have been focused on texturing the surface of silicon with nanostructures (such as nanocones, NWs, etc.). One dimensional (1-D) SiNWs have enhanced light absorption capability and received increasing research interest because of their higher surface-to-volume ratio, strong light trapping effect, fast charge transport, and high charge collection efficiency by shortening the carrier transport path in comparison to bulk Si. , Thus, changes in the length, diameter, and spacing of SiNWs developed after the etching process reveal improvement of material properties, such as light absorption and scattering, enhancement of surface built-in-field, , electron–hole recombination, quantum confinement, and so forth. This leads to the enhanced application in photodetectors, − photovoltaics high sensitivity sensors, , field-effect-transistors, , thermoelectric devices, super capacitors, and so on.…”