observed that 4H-SiC NPN BJT exposed to protons suffer both displacement damage and ionization, whereas, a traditional Si BJT suffers mainly from displacement damage. Furthermore, bulk damage introduction rates for SiC BJT were extracted to be 3.3×10 -15 cm 2 , which is an order of magnitude lower compared to reported Si values. Finally, from detailed analysis of the base current at low injection levels, it is possible to distinguish when surface recombination leakage is dominant over bulk recombination.
IntroductionNumerous studies have been done to reveal the influence of electron, gamma, and proton radiation on various types of Si devices, such as metal insulator semiconductor field effect transistors (MISFET), diodes and bipolar junction transistor (BJT) [1][2][3]. Generally, BJT are considered to be radiation hard, but among the different radiation types they are particularly sensitive to proton irradiation. Extensive research has been done to understand and analytically model the proton radiation induced degradation mechanism in Si BJTs [2,4,5]. Silicon carbide (SiC) electronics has shown superior operational capabilities over Si devices under extreme environments [6][7][8]. However, there exist few mechanistic studies of the behavior of SiC BJTs under proton irradiation. This paper investigates the contribution of proton irradiation on the forward current gain degradation of SiC BJTs. The importance of bulk lifetime (τ b ) and concentration of interface traps (D it ) on the excess base current is evaluated by using numerical analysis and physical device simulations.