2016
DOI: 10.1002/adfm.201505215
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Effects of a Molecular Monolayer Modification of NiO Nanocrystal Layer Surfaces on Perovskite Crystallization and Interface Contact toward Faster Hole Extraction and Higher Photovoltaic Performance

Abstract: NiO is a promising hole transporting material for perovskite solar cells due to its high hole mobility, good stability, easy processibility, and suitable Fermi level for hole extraction. However, the efficiency of NiO‐based cells is still limited by the slow hole extraction due to the poor perovskite/NiO interface and the inadequate quality of the two solution‐processed material phases. Here, large influences of a monolayer surface modification of NiO nanocrystal layers with ethanolamine molecules are demonstr… Show more

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Cited by 324 publications
(282 citation statements)
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“…The valence band edge (E VB ) of NiO x has been reported to vary from 5.05 to 5.5 eV and depends on the surface condition of NiO x . 19,22,25,26,33,37 The surface condition of NiO changes due to exposure to air or by surface treatments. The open circuit voltage (V OC ) is determined by the difference between the E VB of NiO x and the conduction band of PCBM.…”
Section: ¹1mentioning
confidence: 99%
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“…The valence band edge (E VB ) of NiO x has been reported to vary from 5.05 to 5.5 eV and depends on the surface condition of NiO x . 19,22,25,26,33,37 The surface condition of NiO changes due to exposure to air or by surface treatments. The open circuit voltage (V OC ) is determined by the difference between the E VB of NiO x and the conduction band of PCBM.…”
Section: ¹1mentioning
confidence: 99%
“…NiO x has been introduced as the HTM and electron blocking layer for perovskite solar cells to improve the stability of the device by place from organic HTM to inorganic HTM. [19][20][21][22][23][24][25][26][27][28][29] The valence band edge (E VB ) of NiO x is also energetically matched with that of perovskite. 19,22,25,26,33 The transmittance of NiO x is very high in the visible region because the band gap of NiO is over 3.0 eV.…”
Section: Introductionmentioning
confidence: 99%
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“…However, for fast and large scale roll-to-roll fabrication, coating or printing processes for the application of the NiO x films are of interest. In this regard, several methods using spin coating followed by an additional annealing step are reported [23][24][25]. Interestingly, higher temperature treatment of the NiO x films significantly affects the device performance.…”
Section: Introductionmentioning
confidence: 99%