2018
DOI: 10.1016/j.jallcom.2018.02.227
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Effects of annealing on hardness and corrosion resistance of 60NiTi film deposited by magnetron sputtering

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Cited by 22 publications
(5 citation statements)
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“…It has been reported that annealing at more than 400 °C can fully crystallize as-deposited 60NiTi film, which is still amorphous after annealing at 300 °C [29]. Figures 1(a-c) show the SEM images of the crosssectional topographies of the 60NiTi films in different heat-treated conditions.…”
Section: Microstructures Of 60niti Filmsmentioning
confidence: 99%
See 1 more Smart Citation
“…It has been reported that annealing at more than 400 °C can fully crystallize as-deposited 60NiTi film, which is still amorphous after annealing at 300 °C [29]. Figures 1(a-c) show the SEM images of the crosssectional topographies of the 60NiTi films in different heat-treated conditions.…”
Section: Microstructures Of 60niti Filmsmentioning
confidence: 99%
“…Neupane et al [28] found that 60NiTi bulk alloy exhibited excellent tribological performance under dry reciprocating movement, and its high H/E was an important contributor. However, in terms of 60NiTi film, only few studies exist, and they mainly focus on the effects of annealing on hardness and corrosion resistance of sputter-deposited 60NiTi film [29]. In another word, the tribological performance of 60NiTi film remains unexplored.…”
Section: Introductionmentioning
confidence: 99%
“…The hardness of all AA5083-H111 alloy samples was tested before the EIS experiments and a correlation was reported between the hardness and corrosion resistance [12,13]. The hardness results are presented in Fig.…”
Section: Hardness Testingmentioning
confidence: 99%
“…When the direct manipulation of raw materials is challenging, surface modification emerges as a robust strategy to enhance both performance and durability, particularly for materials subjected to harsh environments or extreme conditions. To enhance surface properties, various advanced surface modification techniques have been developed, including plasma or gas nitriding [33,34], magnetron sputtering [35], and ion implantation [36].…”
Section: Introductionmentioning
confidence: 99%