“…At present, various deposition methods have been used to grow ZnO and its related compounds, such as chemical vapor deposition (CVD), molecular beam epitaxy (MBE), sputtering, pulse laser deposition (PLD), electron-beam evaporation, atomic layer deposition (ALD) and hydrothermal method [4][5][6][7][8][9][10]. ALD is an altered CVD growth method that based on self-limiting mechanism, in which precursors (gases or vapors) are alternately pulsed onto the substrate surface.…”