“…Of these oxides, Sm 2 O 3 has been seen as one of the most promising candidates due to its high dielectric constant (∼15), a wide bandgap (4.33 eV), high conduction barrier (>1 eV), high breakdown electric field (5-7 MV/cm), and its good thermal stability when in direct contact with Si [14,[18][19][20][21][22][23][24][25]. Various deposition methods have been studied, such as metallo-organic chemical vapour deposition [26], pulsed laser deposition (PLD) [27], thermal evaporation [28], vacuum evaporation [29], resistive evaporation [30], anodisation [25], direct current (DC), and radio frequency (RF) sputtering [14,20,21,31,32].…”