2016
DOI: 10.1007/s10854-016-4385-9
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Effects of anodization duration on the properties of sputtered samarium thin films on silicon substrate

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Cited by 1 publication
(4 citation statements)
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“…The attained dielectric constants for all the anodised samples range from 8.11 to 10.30. However, these obtained values are lower as compared with the reported literature values of ∼15 [14,[18][19][20][21][22][23][24][25]. This might be due to the extremely high value of Q eff , STD, D it , and D total , charges are trapped in Si metal, IL and less charge are transmitted to the Al gate, and thus the dielectric values are lower as compared with the literature values.…”
Section: Resultscontrasting
confidence: 62%
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“…The attained dielectric constants for all the anodised samples range from 8.11 to 10.30. However, these obtained values are lower as compared with the reported literature values of ∼15 [14,[18][19][20][21][22][23][24][25]. This might be due to the extremely high value of Q eff , STD, D it , and D total , charges are trapped in Si metal, IL and less charge are transmitted to the Al gate, and thus the dielectric values are lower as compared with the literature values.…”
Section: Resultscontrasting
confidence: 62%
“…Of these oxides, Sm 2 O 3 has been seen as one of the most promising candidates due to its high dielectric constant (∼15), a wide bandgap (4.33 eV), high conduction barrier (>1 eV), high breakdown electric field (5-7 MV/cm), and its good thermal stability when in direct contact with Si [14,[18][19][20][21][22][23][24][25]. Various deposition methods have been studied, such as metallo-organic chemical vapour deposition [26], pulsed laser deposition (PLD) [27], thermal evaporation [28], vacuum evaporation [29], resistive evaporation [30], anodisation [25], direct current (DC), and radio frequency (RF) sputtering [14,20,21,31,32].…”
Section: Introductionmentioning
confidence: 99%
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