Size and spatial distribution homogeneity of nanostructures is greatly improved by making stacks of nanostructures separated by thin spacers. In this work, we present in situ and in real time stress measurements and reflection high-energy electron diffraction observations and ex situ transmission electron microscopy ͑TEM͒ characterization of stacked layers of InAs quantum wires ͑QWRs͒ separated by InP spacer layers, d(InP), of thickness between 3 and 20 nm. For d(InP)Ͻ20 nm, the amount of InAs involved in the created QWR from the second stack layer on, exceeds that provided by the In cell. Our results suggest that in those cases InAs three dimensional islands formation starts at the P/As switching and lasts during further InAs deposition. We propose an explanation for this process that is strongly supported on TEM observations. The results obtained in this work imply that concepts like the existence of a critical thickness for two-to three-dimensional growth mode transition should be revised in correlated QWR stacks of layers. © 2004 American Institute of Physics. ͓DOI: 10.1063/1.1759374͔The incorporation of nanostructures in electronic and optoelectronic devices provides properties improvement and design possibilities, yet requiring the control of their size and position. For self-assembled nanostructures, the size homogeneity and spatial distribution can be greatly improved by stacking several layers. [1][2][3][4] In this context, the vertical stacks of self-assembled InAs quantum wires ͑QWRs͒ grown on InP͑001͒ are of particular interest for lasers, as they emit light at 1.30 and 1.55 m. [5][6][7] In stacks of nanostructures, the buried ones produce inhomogeneous strain fields that propagate toward the capping layer surface where the next nanostructures will be formed. 1,2 This leads to a vertical correlation between the nanostructures layers depending both on the size of the buried nanostructures and the spacer layer thickness.In this work, we have studied the growth of multilayers of InAs QWRs with different spacer layer thicknesses, d(InP), by in situ and in real time stress measurements and reflection high-energy electron diffraction ͑RHEED͒. A strong influence of the spacer layer thickness on QWR formation process in the second and successive layers of the stack has been observed: QWRs are correlated for d(InP)Ͻ20 nm, where a reduction of the amount of deposited InAs necessary for QWR formation ͑observed by RHEED͒ together with an increase in InAs growth rate ͑ob-tained from stress measurements͒ take place. In order to explain these results, we propose a model that is strongly supported by transmission electron microscopy ͑TEM͒ images. Our experiments provide quantitative values of the extra amount of material involved in the formation of vertically correlated self-assembled nanostructures, as well as the evidence of the absence of a two-dimensional ͑2D͒-threedimensional ͑3D͒ growth mode transition as the relevant process in nanostructures self-assembling during stacking.The samples under study consist of...