2004
DOI: 10.1063/1.1759374
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Stacking of InAs/InP(001) quantum wires studied by in situ stress measurements: Role of inhomogeneous stress fields

Abstract: Size and spatial distribution homogeneity of nanostructures is greatly improved by making stacks of nanostructures separated by thin spacers. In this work, we present in situ and in real time stress measurements and reflection high-energy electron diffraction observations and ex situ transmission electron microscopy ͑TEM͒ characterization of stacked layers of InAs quantum wires ͑QWRs͒ separated by InP spacer layers, d(InP), of thickness between 3 and 20 nm. For d(InP)Ͻ20 nm, the amount of InAs involved in the … Show more

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Cited by 32 publications
(34 citation statements)
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“…In fact, the InAs QWr can be formed by As/ P exchange after a long-time exposure of an InP surface to an arsenic flux even without indium deposition. 9,13 C. Size control by changing the InP cap layer growth temperature Figure 4 shows the PL measurements in samples of series C, where we used different substrate temperatures ͑T cap ͒ during InP cap layer growth. We see that the measured PL spectrum shifts to shorter wavelengths as T cap increases from 380 to 515°C.…”
Section: B Qwr Size Control By the Inas Deposition Ratementioning
confidence: 99%
See 1 more Smart Citation
“…In fact, the InAs QWr can be formed by As/ P exchange after a long-time exposure of an InP surface to an arsenic flux even without indium deposition. 9,13 C. Size control by changing the InP cap layer growth temperature Figure 4 shows the PL measurements in samples of series C, where we used different substrate temperatures ͑T cap ͒ during InP cap layer growth. We see that the measured PL spectrum shifts to shorter wavelengths as T cap increases from 380 to 515°C.…”
Section: B Qwr Size Control By the Inas Deposition Ratementioning
confidence: 99%
“…For example, the exchange processes are temperature dependent 6,7 and they are also influenced by the strain distribution at the growth front. 9 Thus, if appropriately controlled, they can be used as a design tool for the emission wavelength. Our aim in this work is to study different ways of controlling the size of MBE-grown InAs/ InP͑001͒ QWrs, establishing procedures to engineer the emission wavelength of these nanostructures.…”
Section: Introductionmentioning
confidence: 99%
“…The InAs nanostructures were formed by the Stranski-Krastanov method depositing 1.7 monolayers (MLs) of InAs at a substrate temperature of 515 C with a growth rate of 0.1 ML/s. Due to the anisotropic character of the elastic relaxation in this system, QWRs arrays are naturally arranged along the [1][2][3][4][5][6][7][8][9][10] crystal direction as explained elsewhere. 9 Figure 1 shows an atomic force microscopy (AFM) image of an uncapped sample which exhibits a typical QWR width and height of 11 and 3.2 nm forming quasi-periodic structures (with pitch period around 18 nm).…”
Section: Samples and Experimental Setupmentioning
confidence: 99%
“…In this case, the amount of InP formed will be even larger than that obtained in plain InAs surfaces, as the P / As exchange will be enhanced by the strain. 6,7 The effects produced by the P / As exchange can be beneficial to adjust the QWr size for a predetermined emission wavelength. Figure 2 shows the 12 K PL (continuous line) and 300 K (dotted lines) spectra of the first series of samples studied (one layer of QWr capped by InP grown at LT, MT, and HT regions).…”
mentioning
confidence: 99%
“…1-3 However, these nanostructures have not been as extensively exploited as InAs/ GaAs QD partly due to the intrinsic peculiarities of the interface between III-V A / III-V B compounds: On one hand, an asymmetric stress appears at the InAs/ InP interface; 4 on the other hand, complicated V A /V B exchange processes take place during epitaxial growth. Although P / As exchange has been widely studied, [5][6][7][8][9][10][11][12][13][14][15] a deeper understanding of this process is still needed since it determines the size of the nanostructures, governing their emission wavelength.…”
mentioning
confidence: 99%