2018
DOI: 10.1364/oe.26.003568
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Effects of carrier injection profile on low noise thin Al085Ga015As056Sb044 avalanche photodiodes

Abstract: 5787318).

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Cited by 21 publications
(21 citation statements)
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“…One problem encountered with AlAsSb is that the material system is prone to oxidizing very easily when exposed to air, consequently passivation of the devices is necessary. Excess noise measurements on thin AlGaAsSb (Al=85%) p-i-n diodes showed that a k = 0.1 could be achieved with a 87 nm avalanching width and that this improved to k = 0.05 when the width increased to 170 nm [33]. A much thicker structure may well give similar k values to that seen in AlAsSb, but with the added advantage that the AlGaAsSb material system should be more stable.…”
Section: Discussionmentioning
confidence: 99%
“…One problem encountered with AlAsSb is that the material system is prone to oxidizing very easily when exposed to air, consequently passivation of the devices is necessary. Excess noise measurements on thin AlGaAsSb (Al=85%) p-i-n diodes showed that a k = 0.1 could be achieved with a 87 nm avalanching width and that this improved to k = 0.05 when the width increased to 170 nm [33]. A much thicker structure may well give similar k values to that seen in AlAsSb, but with the added advantage that the AlGaAsSb material system should be more stable.…”
Section: Discussionmentioning
confidence: 99%
“…AlGaAsSb/InGaAs SACM APDs have been developed with multiplication and absorption layer thicknesses of 100 nm and 300 nm, respectively. These APDs exhibited keff of 0.05 to 0.08 89 and gain bandwidth product ~4 20 GHz. 90 Aside from InAs, which has demonstrated > 500 GHz, this is the highest gain-bandwidth product reported for any APD.…”
Section: Submicron Scaling Of the Multiplication Regionmentioning
confidence: 99%
“…Using a 543 nm wavelength laser as excitation source, which did not achieve pure electron injection, the best data corresponded to an effective ionization coefficient ratio, k eff , of 0.1. Recently the excess noise measurements were improved in [8], which used a 420 nm wavelength excitation source to achieve pure electron and pure hole injection for p-i-n and n-ip diodes, respectively. Data of Al 0.85 Ga 0.15 As 0.56 Sb 0.44 p-i-n diodes from [8] corresponded to k eff as low as 0.05-0.08.…”
Section: Excess Noise Characteristicsmentioning
confidence: 99%
“…Recently the excess noise measurements were improved in [8], which used a 420 nm wavelength excitation source to achieve pure electron and pure hole injection for p-i-n and n-ip diodes, respectively. Data of Al 0.85 Ga 0.15 As 0.56 Sb 0.44 p-i-n diodes from [8] corresponded to k eff as low as 0.05-0.08. Both works found electron injection to be preferable for achieving the lowest possible excess noise characteristics, hence electrons have higher ionization coefficient than holes.…”
Section: Excess Noise Characteristicsmentioning
confidence: 99%
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