2017
DOI: 10.1016/j.electacta.2017.06.034
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Effects of fluoride ions in the growth of barrier-type films on aluminium

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Cited by 18 publications
(9 citation statements)
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“…8 A previous study of fluoride incorporation into barrier-type films showed that fluoride ions migrate inwards in anodic alumina at about twice the rate of O 2− ions. 23 Consequently, a fluoride-rich layer should be present next to the substrate and also along the cell boundaries in the present films, as illustrated in the schematic diagram of Figure 9. The presence of a fluoride-rich layer at the film base was found by XPS analysis of a film formed in oxalic acid with added fluoride, 9 and is suggested to be present in the films formed in sulfuric acid according to the GDOES profiles of Figure 6.…”
Section: Resultsmentioning
confidence: 95%
“…8 A previous study of fluoride incorporation into barrier-type films showed that fluoride ions migrate inwards in anodic alumina at about twice the rate of O 2− ions. 23 Consequently, a fluoride-rich layer should be present next to the substrate and also along the cell boundaries in the present films, as illustrated in the schematic diagram of Figure 9. The presence of a fluoride-rich layer at the film base was found by XPS analysis of a film formed in oxalic acid with added fluoride, 9 and is suggested to be present in the films formed in sulfuric acid according to the GDOES profiles of Figure 6.…”
Section: Resultsmentioning
confidence: 95%
“…However, Cl – has higher discharge and activation abilities compared to O 2– . When the dense films are anodized in the ppm NH 4 Cl electrolytes, Cl – also does not stay only on the surface of the oxide films but migrates to the inside. , Moreover, compared to O 2– , Cl – exhibits a greater migration rate under the same E . It weakens the electrostatic interaction between Al 3+ and O 2– , restraining the formation process of oxide films.…”
Section: Resultsmentioning
confidence: 99%
“…The following supporting information can be downloaded at: https://www.mdpi.com/article/10.3390/coatings12070908/s1, Figure S1 S1: Chemical composition measured by XPS on barrier oxide layers at 45° and 15° take-off angles, Table S2: Constraints applied for the curve fitting of the O1s and C1s photoelectron peaks as proposed by Abrahami et al, Table S3: Atomic concentration and standard deviation calculated from three independent measurements of each deconvoluted chemical state in the C1s and O1s photoelectron peaks, Table S4: Chemical composition estimated from the detailed spectra of porous anodic oxide films. References [43][44][45][46] are cited in the supplementary materials.…”
Section: Supplementary Materialsmentioning
confidence: 99%