Effects of hot isostatic pressing on the performance of CVD ZnSe

Macro- and micro-structural manifestation and engineering of large-size polycrystalline ZnSe

“…By improving the crystal process, upgrading the equipment, and continuously optimizing the growth parameters, we obtained a high-transmittance, lowabsorption-coefficient ZnSe material with a diameter of 100 mm and thickness of 10 mm which is larger than the previously reported ZnSe single crystal and polycrystalline materials. 11,[17][18][19] Different samples were analyzed using an X-ray diffractometer (40 kV, Cu, 5°min −1 , step 0.02°) for the XRD patterns. The surface morphology of the ZnSe samples grown by the CVD method was observed using a universal optical microscope.…”

“…By improving the crystal process, upgrading the equipment, and continuously optimizing the growth parameters, we obtained a high-transmittance, low-absorption-coefficient ZnSe material with a diameter of 100 mm and thickness of 10 mm which is larger than the previously reported ZnSe single crystal and polycrystalline materials. 11,17–19…”

“…Considering the advantages in preparing largesized ZnSe, the polycrystalline substance promotes linear optical applications in optical imaging and windows under harsh working environments, [4][5][6][7][8] and nonlinear optics as the gain medium for random phase-matching conditions based on controllable grain sizes. 9 Currently, the main methods used to prepare polycrystalline ZnSe materials include hot pressing, 10,11 physical vapor deposition, 12 and chemical vapor deposition (CVD). 13 Among them, the CVD method can grow polycrystalline ZnSe with high density, which allows relatively easy optical processing with high environmental resistance.…”