Effects of metal Ni with catalytic activity on magnetron sputtered Cr–Si resistive film in a heat and humid environment

Wang, Xinyan; Zhang, Z.S.; Shao, Jing; Bai, Tian

doi:10.1016/j.surfcoat.2010.10.018

Cited by 13 publications

(1 citation statement)

References 26 publications

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“…Among them, CrSi film is widely used because of its adjustable square resistance [1] (about 0.1~2 Kohm/square), good stability, high precision and easy integration. However, its manufacturing process and electrical parameter variation propensity have not yet been thoroughly and methodically discussed, although many great study findings have been made in the field of CrSi thin film resistors [2][3][4][5].…”

Section: Introductionmentioning

confidence: 99%

Fabrication process and variation rule of electrical properties of CrSi thin film resistors

Zhu,

Zhang,

et al. 2024

J. Phys.: Conf. Ser.

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CrSi film is sputtered on SiO2 by reactive magnetron sputtering method, on which TIW layer is deposited as the resistance end. After lithographic patterns and corrosion, metal layer is deposited and etched as input and output to test the electrical parameters of the film. It is discovered that the target’s component determines the electrical parameters’ adjustable range. It is possible to stabilize the temperature coefficient of resistance of CrSi film in ±10ppm/oC by adjusting the process parameters, resulting in reduction of fluctuations compared with the widely used ±20ppm/oC, and obtainment of high-precision CrSi film resistors. In addition, microscopic factors such as grain size and spacing must be considered. CrSi grains, which transmit electrons, and the SiN groups, which are dispersed along the grain spacing and permit electron tunnelling, dictate the electrical characteristics of the film. The law of process adjustment parameters is clarified through the comparison of different component targets, which has important reference value and guiding significance for the future research of similar targets or high-precision resistors.

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Section: Introductionmentioning

confidence: 99%

Fabrication process and variation rule of electrical properties of CrSi thin film resistors

Zhu,

Zhang,

et al. 2024

J. Phys.: Conf. Ser.

View full text Add to dashboard Cite

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Failure behaviors and mechanisms of high-ohmic resistors protected by PF/EP paint in heat and humid environment

Wang

Cheng

et al. 2016

Trans. Tianjin Univ.

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Deposition of Cr–Si–Ni–Mo films at a low sputtering current and performance of heat and humid resistance

Wang

et al. 2014

Applied Surface Science

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Effects of metal Ni with catalytic activity on magnetron sputtered Cr–Si resistive film in a heat and humid environment

Cited by 13 publications

References 26 publications

Fabrication process and variation rule of electrical properties of CrSi thin film resistors

Fabrication process and variation rule of electrical properties of CrSi thin film resistors

Failure behaviors and mechanisms of high-ohmic resistors protected by PF/EP paint in heat and humid environment

Deposition of Cr–Si–Ni–Mo films at a low sputtering current and performance of heat and humid resistance

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