Ultraviolet photodetectors (UVPDs) based on Si-Zn-SnO (SZTO) thin-film transistors (TFTs) with a stacked dual-channel layer (DCL) structure with different carrier concentration and NiO capping layer (CL) to alleviate the trade-off between dark current (I
dark) and photocurrent (I
ph) are reported. Experimental results show that under 275 nm irradiation, the proposed SZTO TFT UVPD with a 30-nm-thick upper layer stacked on a 50-nm-thick channel layer and a patterned NiO CL exhibit excellent photoresponsivity and photosensitivity up to 1672 A/W and 1.03×107 A/A, which is about 272 and 137 times higher than conventional 30-nm-thick single-channel layer SZTO TFT. These improvements are due to the use of DCL forms a high-low junction to reduce the effective channel thickness and increase the space for UV illumination and the use of NiO CL lowers the I
dark and causes a considerable negative threshold voltage shift under UV irradiation to significantly boost the I
ph.