2002
DOI: 10.1016/s0921-5107(02)00055-7
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Effects of Ni implantation into bulk and epitaxial GaP on structural and magnetic characteristics

Abstract: Structural and magnetic characteristics of Ni-implanted GaP were measured for doses in the range 3 Á/5 )/10 16 cm (2 . After subsequent annealing at 700 8C, transmission electron microscopy (TEM) showed residual lattice damage which was more significant in highly carbon-doped epi layers as compared to bulk GaP substrates. The magnetization measurements showed two different contributions, one present at 5/75 K and the other below Â/225 K. No secondary phase formation was detected in either type of GaP. #

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