Effects of nitrilotriacetic acid and corrosion inhibitor on cobalt barrier chemical–mechanical polishing: Experimental and density functional theory analysis

Zhang, Xinbo; Pan, Guofeng; Hu, Lianjun; Wang, Hao; Wang, Chenwei

doi:10.1016/j.colsurfa.2020.125392

Cited by 57 publications

(21 citation statements)

References 77 publications

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“…All peaks move to the low-energy direction, most of the peaks drop, and the peaks above the Fermi level almost disappear. It indicates that when n -butanol molecules are adsorbed on the surface of NiO, the energy is lower and more stable than that of the free state, while the doped system with the Fe atom is the most stable. − …”

Section: Resultsmentioning

confidence: 99%

High-Performance N-Butanol Gas Sensor Based on Iron-Doped Metal–Organic Framework-Derived Nickel Oxide and DFT Study

Wang

Shao

Liu

et al. 2023

ACS Appl. Mater. Interfaces

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In this study, a straightforward two-step hydrothermal process was used to synthesize Fe-doped NiO nanomaterials. A number of characterization approaches were employed to explore the structure and morphology of the synthesized Fe-doped NiO. The as-prepared samples were multi-layered flower-like structures formed by nanoparticles, according to scanning electron microscopy and transmission electron microscopy studies. The findings of the study on gas sensing performance showed that the response of the 1.5 at % Fe−NiO sensor was nearly 100 times greater than that of the pure NiO sensor, and the lower limit of detection was greatly decreased (50 ppb). The 1.5 at % Fe−NiO sensor exhibited superior sensing performance for n-butanol. The incorporation of an appropriate amount of Fe into the NiO lattice modified the carrier concentration, which is the primary cause of the increased sensor performance of an appropriate amount of Fedoped NiO. In addition, the density functional theory calculation method based on the first-principles theory was used to study the adsorption performance and electronic behavior of pure NiO and 1.5 at % Fe−NiO for n-butanol. The calculated results were consistent with the experimental results.

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Section: Resultsmentioning

confidence: 99%

High-Performance N-Butanol Gas Sensor Based on Iron-Doped Metal–Organic Framework-Derived Nickel Oxide and DFT Study

Wang

Shao

Liu

et al. 2023

ACS Appl. Mater. Interfaces

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“…21 Vibrational analysis was then conducted to optimize the molecular structures of CA and BTA and ensure that the tested molecules reached the minimum point of potential energy. 22 Afterward, the corresponding quantum chemical parameters, including frontier orbital energies (E HOMO , E LUMO , and E Gap ), Fukui function, and electrostatic potential (ESP), were calculated.…”

Section: Methodsmentioning

confidence: 99%

Synergistic Effect of Composite Complex Agent on BTA Removal in Post-Cu-CMP: Experimental and Theoretical Analysis

Du,

Wang,

Wang

et al. 2023

ECS J. Solid State Sci. Technol.

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Nowadays the development of nanoscale-interconnected integrated circuit chips makes the chemical mechanical polishing (CMP) and post-CMP cleaning more challenging. In general, organic residues such as benzotriazole (BTA) can adsorb on the wafer surface after CMP process and form thin films to prevent the contact between cleaning solution and the wafer surface, which thus can seriously affect the post-CMP cleaning process. And the efficient removal of BTA remains problematic due to the potential introduction of additional impurities. Therefore, a new alkaline cleaning solution based on citric acid (CA) was proposed to improve the removal efficiency of BTA. Results exhibit that the cleaning efficiency of BTA residues can reach 98.86% with 400 ppm tetraethyl ammonium hydroxide (TEAH) and 0.6 wt% CA (pH = 10.5). X-ray photoelectron spectroscopy (XPS) measurements show that the cleaning solution can coordinate with copper ions to break the ionization balance of Cu-BTA. In addition, the electronic properties and reaction sites on copper surface were determined by quantum chemical calculation and density functional theory (DFT). The theoretical analysis indicates that CA has hydroxyl and carboxyl functional groups, and its presence with TEAH can promote the complexation of Cu ions, which accelerates the breakage of Cu-BTA and the desorption of BTA from the copper surface.

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“…15 that the polarization curve shifts toward lower currents as the TTA concentration increases, indicating that the cathodic and anodic reactions induced by TTA are inhibited [41]. The main anodic reactions can be expressed as [42]:…”

Section: Electrochemical Experiments Of Comentioning

confidence: 99%

Surface corrosion inhibition effect and action mechanism analysis of 5-methyl-benzotriazole on cobalt-based copper film chemical mechanical polishing for GLSI

Yan

Niu

Luo

et al. 2022

Preprint

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With integrated circuit (IC) technology nodes below 20 nm, the chemical mechanical polishing (CMP) of cobalt (Co)-based copper (Cu) interconnection has been gradually changed to one-step polishing, which requires rapid removal rate (RR) of Cu while controlling the height differences of concave and convex areas on the Cu surface, and finally achieving global planarization. Co as the barrier material is also required a lower RR to ensure a high Cu/Co removal rate selection ratio. Therefore, choosing the appropriate inhibitor in the slurry is extremely important. The corrosion inhibitor 5-methyl-benzotriazole (TTA) was thoroughly examined in this study for its ability to prevent corrosion on Cu film as well as its mode of action. The experimental results showed that TTA can effectively inhibit the removal of Cu under both dynamic and static conditions, which was also confirmed by scanning electron microscopy (SEM) and atomic force microscopy (AFM) tests. The corrosion inhibition effect and mechanism of TTA was further revealed by open circuit potential (OCP), polarization curve, adsorption isotherm, quantum chemical calculation, UV-Visible and X-ray photoelectron spectroscopy (XPS) tests. It was found that TTA can inhibit the corrosion of Cu by physical and chemical adsorption on the Cu surface, which is conductive to obtain excellent planarization properties. At the same time, it was also found TTA can also inhibit the corrosion of Co by forming Co-TTA and promoting the conversion of Co(OH)2 to Co3O4, and a Cu/Co removal rate selection ratio of 104 was obtained, which provides a suitable corrosion inhibitor for the polishing of Co-based Cu interconnection CMP and has a broad application prospect.

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Effects of nitrilotriacetic acid and corrosion inhibitor on cobalt barrier chemical–mechanical polishing: Experimental and density functional theory analysis

Cited by 57 publications

References 77 publications

High-Performance N-Butanol Gas Sensor Based on Iron-Doped Metal–Organic Framework-Derived Nickel Oxide and DFT Study

High-Performance N-Butanol Gas Sensor Based on Iron-Doped Metal–Organic Framework-Derived Nickel Oxide and DFT Study

Synergistic Effect of Composite Complex Agent on BTA Removal in Post-Cu-CMP: Experimental and Theoretical Analysis

Surface corrosion inhibition effect and action mechanism analysis of 5-methyl-benzotriazole on cobalt-based copper film chemical mechanical polishing for GLSI

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