1999
DOI: 10.1016/s0022-0248(99)00142-6
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Effects of rapid thermal annealing on electron beam evaporated SrS:Ce thin film electroluminescent devices made in H2S ambient

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Cited by 3 publications
(2 citation statements)
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“…Thirdly, films deposited at low temperature by PVD processes were amorphous. In order to obtain polycrystalline layers, high substrate temperatures or post-deposition annealing treatments [ 70 ] had to be used. Finally, while the most straightforward PVD technique for sulfide films is electron beam evaporation, alternative techniques such as magnetron sputtering [ 71 ] and ALD (atomic layer deposition) [ 72 , 73 ] were also employed, allowing a better control of the thin film properties.…”
Section: Thin Film Electroluminescencementioning
confidence: 99%
“…Thirdly, films deposited at low temperature by PVD processes were amorphous. In order to obtain polycrystalline layers, high substrate temperatures or post-deposition annealing treatments [ 70 ] had to be used. Finally, while the most straightforward PVD technique for sulfide films is electron beam evaporation, alternative techniques such as magnetron sputtering [ 71 ] and ALD (atomic layer deposition) [ 72 , 73 ] were also employed, allowing a better control of the thin film properties.…”
Section: Thin Film Electroluminescencementioning
confidence: 99%
“…The influence of ZnS buffer layers is twofold. 4 Through a crystalline buffer layer the electrons are accelerated and injected with a higher energy into the phosphor layer. Subsequently there are more "hot" electrons for impact excitation.…”
Section: Methodsmentioning
confidence: 99%