Effects of sputtering pressure and post-metallization annealing on the physical properties of rf-sputtered Y2O3 films

Yu, Zhi‐Ming; Liang, Lingyan; Liu, Z.M.; Xü, Wei; Sun, Xueqing; Cao, Hu

doi:10.1016/j.jallcom.2011.02.127

Cited by 10 publications

(3 citation statements)

References 40 publications

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“…It was considered that refractive index ( n ) is related to packing density of the film. The Drude equation 43,44 was usually used to confirm the above analysis where p is the mean value of the porosity, n f is refractive index of porous materials, n b is the refractive index of bulk materials. The refractive index ( n b ) of ZnO bulk is 2·008 at 633 nm.…”

Section: Resultsmentioning

confidence: 99%

Effect of substrate temperature on microstructure and optical properties of Ga doped ZnO films deposited by pulsed laser deposition

Zou

Wang

Yang

et al. 2015

Surface Engineering

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Gallium doped ZnO (GZO) films were deposited on Si (100) and fused silica substrates by pulsed laser deposition at substrate temperature varying from 300 and 600uC. The crystal structure of the deposited film is found to be c axis preferred orientation. The X-ray diffraction results demonstrate that the crystallinity of GZO film is improved and then deteriorated when substrate temperature increases from 300 to 600uC. The average surface roughness slightly decreases from 7?2 to 5?0 nm then increases to 15?6 nm as the substrate temperature reaches 600uC. The optical band gap of the film is found to increase slightly from 3?28 to 3?33 eV with increasing substrate temperature from 300 to 600uC. The refractive index of the GZO film first increases as the substrate temperature increases from 300 to 400uC then decreases when further increases the substrate temperature to 600uC, and is in the range of 1?87-2?23.

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Section: Resultsmentioning

confidence: 99%

Effect of substrate temperature on microstructure and optical properties of Ga doped ZnO films deposited by pulsed laser deposition

Zou

Wang

Yang

et al. 2015

Surface Engineering

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“…For example, it has been shown that a low oxygen partial pressure and reaction temperature tend to make the film in an oxygen-deficient environment, which favors the growth of the monoclinic phase rather than the cubic phase [9,19,21,22]. Nevertheless, Y 2 O 3 films, regardless of their as-deposited structure, will transform to the cubic phase at an elevated temperature [23][24][25][26].…”

Section: Introductionmentioning

confidence: 99%

Effects of the Deposition Mode and Heat Treatment on the Microstructure and Wettability of Y2O3 Coatings Prepared by Reactive Magnetron Sputtering

Huang

2022

Coatings

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A robust hydrophobic Y2O3 coating at high temperatures is important for industrial applications. In this study, Y2O3 thin films on Si substrates were prepared by reactive direct current magnetron sputtering. By changing the deposition power, Y2O3 thin films with different microstructures were obtained in poison mode and metallic mode, respectively. In order to understand the effect of heat treatment on the microstructure and hydrophobicity of Y2O3, the samples were annealed at 400 °C in the air. Compared to metallic mode, no crack was formed on the surface of the Y2O3 film prepared in poison mode. In addition, the water contact angle on the surface of the Y2O3 thin film deposited in poison mode was above 90° before and after annealing at 400 °C. It has been demonstrated that the initial high concentration of physically absorbed oxygen and its slow desorption process in a Y2O3 thin film prepared in poison mode contributes to the hydrophobicity of the thin film at high temperatures. These results can provide insights into the large-scale fabrication of hydrophobic Y2O3 coatings for high-temperature applications.

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“…Y 2 O 3 is an important material for optical applications because of its excellent optical and mechanical properties including a wide transmission window from 250 nm to about 8 lm [13,14]. Y 2 O 3 films have been deposited and characterized using many techniques for different purposes [15,16]. Zhang et al [17] found that the hardness of ZnS coated with Y 2 O 3 and SiO 2 multilayer increased from 250 to 430 kg/mm 2 and the transmittance increased from 63% to 83% at 3-5 lm.…”

Section: Introductionmentioning

confidence: 99%

Experimental and numerical study on structural and thermal radiation properties of yttrium oxide sputtered on sapphire

Liu

et al. 2015

Journal of Alloys and Compounds

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Effects of sputtering pressure and post-metallization annealing on the physical properties of rf-sputtered Y2O3 films

Cited by 10 publications

References 40 publications

Effect of substrate temperature on microstructure and optical properties of Ga doped ZnO films deposited by pulsed laser deposition

Effect of substrate temperature on microstructure and optical properties of Ga doped ZnO films deposited by pulsed laser deposition

Effects of the Deposition Mode and Heat Treatment on the Microstructure and Wettability of Y2O3 Coatings Prepared by Reactive Magnetron Sputtering

Experimental and numerical study on structural and thermal radiation properties of yttrium oxide sputtered on sapphire

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