Effects of substrate bias on the resistivity and microstructure of molybdenum and molybdenum silicide films

Lin, J.S.; Budhani, R. C.; Bunshah, R.F.

doi:10.1016/0040-6090(87)90196-9

Cited by 23 publications

(11 citation statements)

References 12 publications

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“…The observed reduction in the films thickness could be the reason for the decrease in the intensity of the peaks and increase in the tensile strain with increase in the substrate bias. [19,23,24], but the crystallite size of our films is much smaller than those reported earlier. The electrical transport properties of the films were studied using a commercial 10 mK dilution refrigerator.…”

Section: Resultscontrasting

confidence: 73%

“…The resistivity of our films is much lesser than the values reported (~ 40-80 -cm) for the Mo films with comparable or larger crystallite sizes [8,27,30]. The effect of oxygen contamination during the film growth upon its electrical properties is well documented [12,19,20]. The reduced sheet resistance and resistivity of the films in present work could be attributed to lesser oxygen contamination due to increase in the deposition rate and repulsion of negative oxygen ions away from the growing films [20].…”

Section: Resultsmentioning

confidence: 75%

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Negative substrate bias induced modifications of the physical properties of DC sputter deposited nano-crystalline Mo thin films

Sharma¹,

Abhirami²,

Amaladass³

et al. 2018

Mater. Res. Express

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The negative bias on the substrate during DC sputter deposition of nano-crystalline molybdenum thin films has been utilized to tune their properties for solar cells and the cryogenic radiation detector applications. Films have been deposited on Si substrates under different out of plane negative biases aiming to improve their physical properties such as the sheet resistance, superconducting transition temperature, width of transition and surface roughness. Significant modifications in the electrical and surface morphological properties of nano-crystalline Mo thin films have been reported. The superconducting transition temperature and crystallite size of the films does not show much improvement but the surface roughness and electrical resistivity of the film have been improved by the application of substrate bias.

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Section: Resultscontrasting

confidence: 73%

Section: Resultsmentioning

confidence: 75%

Negative substrate bias induced modifications of the physical properties of DC sputter deposited nano-crystalline Mo thin films

Sharma¹,

Abhirami²,

Amaladass³

et al. 2018

Mater. Res. Express

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“…Based on the previously discussed SEM cross‐sectional images, Mo grains were approximated as evenly spaced, parallel square columns with the grain width ( d s ) and the film thickness ( h ) having values of 50 and 680 nm, respectively. Based on transmission electron microscopy measurements of Mo films performed by other groups, a value of 3 nm was used for the grain boundary width ( δ ) . Lastly, the accumulation of Na is confined on the surface within a layer of fixed thickness δ s .…”

Section: Resultsmentioning

confidence: 99%

Understanding the role of oxygen in the segregation of sodium at the surface of molybdenum coated soda‐lime glass

et al. 2014

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Molybdenum (Mo) coated soda‐lime glass is a commonly used substrate for Cu(InGa)Se2 solar cells as it also acts as the sodium (Na) source, which improves the efficiency of these devices. In this work, we investigate how oxygen controls the segregation and accumulation of Na on the Mo surface. A direct relationship between the concentration of surface oxygen and the amount of Na accumulation is showed. Values for the surface segregation ratio and grain boundary diffusion coefficient for Na in Mo are obtained by fitting diffusion data at several temperatures to a model for grain boundary diffusion. The results of this model reveal that surface oxygen controls the Na saturation level through its effect on the surface segregation of Na. An activation energy for grain boundary diffusion of Na is estimated and is similar to that of MoO bond dissociation in MoO3 suggesting the involvement of this bond during Na transport. © 2014 American Institute of Chemical Engineers AIChE J, 60: 2365–2372, 2014

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“…Because of its low resistivity and high melting point, sputterdeposited thin films of molybdenum (Mo) are increasingly being used as the gate electrode in GaAs-based metal gate field effect transistors (MESFETs) and silicon-based metal-oxidesemiconductor (MOS) devices [2,4,5,9]. Successful performance of Mo as the gate electrode was found to be affected by the deposition conditions.…”

Section: Introductionmentioning

confidence: 99%

“…Successful performance of Mo as the gate electrode was found to be affected by the deposition conditions. Lin et al [5] deposited pure Mo films on steam-oxidized Si wafers by DC magnetron sputtering in argon plasma. He reported that the resistivity of Mo films shows a pronounced decrease with an increase in the negative substrate bias and the rate of film growth.…”

Section: Introductionmentioning

confidence: 99%

Preparation and characterization of DC sputtered molybdenum thin films

Kashyout

Soliman

Abou-Gabal

et al. 2011

Alexandria Engineering Journal

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Molybdenum (Mo) thin films have been deposited on soda-lime glass substrates using a DC magnetron sputtering system. Their electrical resistivity, and their morphological, structural and adhesive properties have been examined with respect to the deposition power, deposition time and substrate temperature. The electrical resistivity of the Mo films could be reduced by increasing any of the above parameters. Within the range of the investigated deposition parameters, the films showed a mono-crystalline nature with a preferred orientation along the (1 1 0) plane. The Mo films adhesion to the soda-lime glass could be improved by increasing the substrate temperature. At a deposition power of 200 W, deposition time of 20 min and substrate temperature of 450°C, Mo thin film exhibiting mono-crystalline structure with thickness equal to 450 nm and electrical resistivity equal to 1.85 · 10 À4 X cm was obtained.ª 2011 Faculty of Engineering, Alexandria University. Production and hosting by Elsevier B.V.All rights reserved.

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Effects of substrate bias on the resistivity and microstructure of molybdenum and molybdenum silicide films

Cited by 23 publications

References 12 publications

Negative substrate bias induced modifications of the physical properties of DC sputter deposited nano-crystalline Mo thin films

Negative substrate bias induced modifications of the physical properties of DC sputter deposited nano-crystalline Mo thin films

Understanding the role of oxygen in the segregation of sodium at the surface of molybdenum coated soda‐lime glass

Preparation and characterization of DC sputtered molybdenum thin films

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