1999
DOI: 10.2494/photopolymer.12.45
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Effects of Substrate Refrigeration on Plasma Polymerization with Fluorocarbons.

Abstract: Effects of refrigeration of substrates during plasma polymerization were investigated with some fluorocarbons. The refrigeration of a substrate stage which worked also as a lower electrode in a plasma reactor changed the phases, gas-liquid-solid, in the reactor in vacuo the same as under normal atmospheric pressure in the case of hexafluoropropene (HFP). The radiofrequency power which was appropriate for yielding a solid polymer was 20-50 W at 230 a K in plasma polymerization of HFP, although the RF power was … Show more

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Cited by 2 publications
(11 citation statements)
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“…Refrigeration of the substrate to be coated was effective in improving the rate of deposition when monomers that cause polymer ablation coexist in the plasma phase [9]. We have already proposed utilization of the difference in phases between coexisting monomers, which was brought about by refrigeration.…”
Section: Effect Of Substrate Refrigerationmentioning
confidence: 99%
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“…Refrigeration of the substrate to be coated was effective in improving the rate of deposition when monomers that cause polymer ablation coexist in the plasma phase [9]. We have already proposed utilization of the difference in phases between coexisting monomers, which was brought about by refrigeration.…”
Section: Effect Of Substrate Refrigerationmentioning
confidence: 99%
“…The plasma reactor system illustrated in Fig. 2 and the polymerization procedure were also identical to those in our previous report [9]. The polymerization was carried out with a radio frequency (RF) power source of 13.56 MHz and sccm (cm3/min under STP) was used as a unit of the monomer flow rate.…”
Section: Introductionmentioning
confidence: 99%
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