2007
DOI: 10.1016/j.apsusc.2007.03.046
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Effects of substrate temperature and oxygen pressure on the magnetic properties and structures of CoFe2O4 thin films prepared by pulsed-laser deposition

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Cited by 41 publications
(14 citation statements)
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“…The films grown at low T DEP showed preferred ͑111͒-texture with some ͑311͒ whereas, at higher temperatures, films prefer to grow in ͑100͒ and ͑311͒ orientation. This represents a considerably different trend from that observed by Zhou et al 10 The growth of crystalline CFO films with ͑111͒-texture at lower temperatures ͑T DEP = 250°C͒ show potential for hybrid multilayer sensor applications and integration with multilayer structures that require lower processing temperatures. anisotropy contribution ͓see Figs.…”
Section: A Crystallographycontrasting
confidence: 49%
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“…The films grown at low T DEP showed preferred ͑111͒-texture with some ͑311͒ whereas, at higher temperatures, films prefer to grow in ͑100͒ and ͑311͒ orientation. This represents a considerably different trend from that observed by Zhou et al 10 The growth of crystalline CFO films with ͑111͒-texture at lower temperatures ͑T DEP = 250°C͒ show potential for hybrid multilayer sensor applications and integration with multilayer structures that require lower processing temperatures. anisotropy contribution ͓see Figs.…”
Section: A Crystallographycontrasting
confidence: 49%
“…It was shown in this study that crystalline CFO thin films with ͑111͒-preferred orientation can be grown at temperatures as low as 250°C, as opposed to the optimum value of 600°C reported in the literature. 10 The films were observed to have a substantial perpendicular magnetic anisotropy, which decreased with decreasing substrate temperature. The variation in perpendicular anisotropy and coercivity with substrate temperature are believed to be predominantly due to the thermal expansion mismatch between the film and the substrate.…”
Section: Discussionmentioning
confidence: 99%
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“…Several methods have been applied to synthesize cobalt-ferrite films, including the pulsed laser deposition [11], RF magnetron-sputtering method [12,13], and the ionbeam deposition [14]. However, most of above methods cannot be commercially used in growing large-scale films for the requirements of high vacuum and high depositing temperatures.…”
Section: Introductionmentioning
confidence: 99%