Effects of surface charge on the second harmonic generation from a Cu electrode

Utility of dodecyl sulfate surfactants as dissolution inhibitors in chemical mechanical planarization of copper

“…F. Here, we note that the average E OCP value prior to the injection of inhibitors in Fig. 5 is about 0.255 V. Compared to this value, the reported values of E PZC for Cu in neutral solutions are considerably lower, ranging between −0.9 and −1.0 V, [54][55][56][57][58] and are known to shift to somewhat less negative voltages in strong acidic solutions. 19 Even including such shifts, E PZC for Cu should still remain at negative values 55,59 and hence substantially below E OCP of the Cu surface that is exposed to the inhibitor.…”

Measurement of differential capacitance for faradaic systems under potentiodynamic conditions: Considerations of Fourier transform and phase-selective techniques

“…The phase-selective capacitance technique is suitable for those systems where each individual parallel branch within Z s only contains capacitive elements, or series connections of capacitances with charge transfer resistances [2][3][4][5][6]. These conditions are satisfied if diffusion limited mass transfer is (i) absent, or (ii) can be described as simple ''restricted diffusion'' with a resistive diffusion impedance in the DC limit, or (iii) in the case of semi-infinite diffusion, can be modeled (as we will show in Section 2.4) with a Warburg element connected in series with an adsorption capacitance.…”

“…It provides an accurate measure of the excess charge at an electrode surface [1][2][3][4][5][6][7], and contains detailed information about microscopic properties of the electrode interface [8][9][10][11][12]. Most traditional differential capacitance techniques use phase-selective AC voltammetry (ACV) [2][3][4][5][6]10,[13][14][15][16] where a sinusoidal perturbation voltage at a fixed frequency is superimposed on the DC voltage of cyclic voltammetry (CV); the in-phase and quadrature components of the resulting AC current are measured as functions of the DC voltage, and the measured parameters are converted to (voltage dependent) C diff . If these measurements are performed at more than one AC frequencies, then the DC voltage scan of CV is repeated every time the frequency is changed [2][3][4][5][6]13].…”

“…Most traditional differential capacitance techniques use phase-selective AC voltammetry (ACV) [2][3][4][5][6]10,[13][14][15][16] where a sinusoidal perturbation voltage at a fixed frequency is superimposed on the DC voltage of cyclic voltammetry (CV); the in-phase and quadrature components of the resulting AC current are measured as functions of the DC voltage, and the measured parameters are converted to (voltage dependent) C diff . If these measurements are performed at more than one AC frequencies, then the DC voltage scan of CV is repeated every time the frequency is changed [2][3][4][5][6]13]. This approach only is practical for systems held in ''long-term'' stationary state that provide identical surface conditions in repetitive CV cycles and throughout the time (at least several minutes in most cases) necessary to complete the multiple DC scans.…”

Methodological Consideration on the Prediction of Electrochemical Mechanical Polishing Process Parameters by Monitoring of Electrochemical Characteristics of Copper Surface

“…However, a material with low dielectric constant (low-k) in a device structure of 65 nm or less requires low down-force mechanical polishing to maintain an integrated structure at the bottom during the subsequent polishing process because of its fragile feature [9]. To overcome these problems, a new planarization technology was developed that uses chemical electrolytes instead of abrasive slurry to compensate for reduced mechanical down force [9][10][11][12]. This new attempt is called electrochemical mechanical polishing (ECMP), and this ECMP process can be used as a technology to replace or supplement the current CMP technology.…”