Efficient fully functionalized photorefractive polymethacrylates with infrared sensitivity and different spacer lengths

Engels, Chris; Steenwinckel, David Van; Hendrickx, Eric; Schaerlaekens, Mark; Persoons, André; Samyn, Celest

doi:10.1039/b102489m

Cited by 32 publications

(20 citation statements)

References 25 publications

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“…However, this has proven to be a considerable challenge since, in addition to its IR absorption properties, the sensitizer has to be compatible with the polymer matrix with regard to solubility, phase stability, and redox activity with respect to the charge transport material and nonlinear chromophore, which provides the electro-optic functionality. 11,12 Despite recent efforts 7,13,14 in the development of IR sensitive photorefractive polymers, the longest operating wavelength reported so far is 975 nm for an all-organic photorefractive thin film device, 15 far below 1550 nm, the wavelength of choice for optical communications. To address this problem, this letter employs multiphoton sensitization and achieves the desired IR sensitization through direct two-photon absorption in a polymer composite that exhibits negligible linear absorption.…”

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confidence: 98%

Photorefractive polymer composite operating at the optical communication wavelength of 1550 nm

Tay

Thomas

Eralp

et al. 2004

Applied Physics Letters

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A photorefractive polymer composite sensitized at 1550 nm through direct two-photon absorption has been developed. We show an external diffraction efficiency of 3% in four-wave-mixing experiments and perform holographic reconstruction of distorted images utilizing thin-film devices made of this polymer composite. Amongst other potential applications, the demonstration of accurate, dynamic aberration correction through holography in this all-organic photorefractive device presents an alternative to complex adaptive optics systems currently employed in through-air optical communication links.

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confidence: 98%

Photorefractive polymer composite operating at the optical communication wavelength of 1550 nm

Tay

Thomas

Eralp

et al. 2004

Applied Physics Letters

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“…An optical gain coefficient of 140 cm − 1 was measured with incorporation of a TNFDM sensitizer. 96 Low-T g PR polyacrylates with carbazole and NLO moieties as pendant groups were designed. For these polymers, an optical gain coefficient of 122 cm − 1 was obtained using 2 wt% of a TNF sensitizer at E = 85 V μm − 1 .…”

Section: Plasticizersmentioning

confidence: 99%

Molecular design of photorefractive polymers

Tsutsumi

2016

Polym J

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This review article describes the current state-of-the-art research on organic photorefractive polymer composites. A historical background on photorefractive materials is first introduced and is followed by a discussion on the opto-physical aspects and the mechanism of photorefractivity. The molecular design of photorefractive polymers and organic compounds is discussed, followed by a discussion on optical applications of the photorefractive polymers. Polymer Journal (2016) 48, 571-588; doi:10.1038/pj.2015.131; published online 27 January 2016 BACKGROUND In this report, the molecular design of organic photorefractive (PR) polymers is reviewed. Organic PR polymers are materials that possess both electro-optical and photoconductive properties. Research on photoconductive polymers, whose pioneering polymer is poly(N-vinyl carbazole) (PVK, PVCz), began in the 1960s. From the 1980s, research on organic nonlinear optical (NLO) materials has been widely conducted in the fields of organic electro-optics and optical nonlinearity. From the 1990s, new technology using organic photorefractivity combined with photoconductive and electro-optical properties was introduced in the field of organic semiconducting materials, 1 and organic light-emitting diodes 2-6 and organic fieldeffect transistors 7 were also debuted in this field. At the same time, the interest of researchers also turned toward the development of organic photovoltaic cells and organic solar cells. [8][9][10][11] The transport of charge carriers through photoconductive manifolds is a common phenomenon found in PR, organic light-emitting diode or organic photovoltaic materials. Thus, the development of materials in each field is expected to merge together to trigger the development of novel materials.The PR effect is a well-known phenomenon that is observed in materials in which refractive index modulation is induced by the space-charge field that results from the redistribution of positive and negative charge carriers separated through photo-excitation. 12 This phenomenon was first reported in inorganic crystals of lithium niobate (LiNbO 3 ) and lithium tantalate (LiTaO 3 ) and was observed through heterogeneous optically induced refractive indices in 1966. 13 Since then, the PR effect has extensively been investigated in many inorganic crystals, and theoretical approaches have been established to explain this phenomenon. 14 In 1991, 1 the first study of PR polymers reported a low diffraction efficiency of 10 −3 to 1% and a small optical gain of 0.33 cm À1 . In 1994, 15 a high diffraction efficiency of 86% (the remaining 14% was attributed to optical losses) and a large optical gain exceeding 200 cm À1 was reported in photoconductive PVK-based PR composites. Over the past two decades, many featured review articles [16][17][18][19][20][21][22][23][24][25][26][27] and book

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“…The azobenzene monomer was synthesized according to the published procedures [11][12][13] [14] . The polymer was obtained by an AIBN free radical polymerization of the azobenzene monomer and octadecyl methacrylate.…”

Section: Synthesis Of Side Chain Crystal Polymermentioning

confidence: 99%

Fundamental study of optical threshold layer approach towards double exposure lithography

Berro

Cho

et al. 2009

Advances in Resist Materials and Processing Technology XXVI

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ABSTRACT193 immersion lithography has reached its maximal achievable resolution. There are mainly two lithographic strategies that will enable continued increase in resolution. Those are being pursued in parallel. The first is extreme ultraviolet (EUV) lithography and the second is double patterning (exposure) lithography. EUV lithography is counted on to be available in 2013 time frame for 22 nm node [1] . Unfortunately, this technology has suffered several delays due to fundamental problems with source power, mask infrastructure, metrology and overall reliability [2] . The implementation of EUV lithography in the next five years is unlikely due to economic factors. Double patterning lithography (DPL) is a technology that has been implemented by the industry and has already shown the proof of concept for the 22nm node [3] .This technique while expensive is the only current path forward for scaling with no fundamental showstoppers for the 32nm and 22nm nodes. Double exposure lithography (DEL) is being proposed as a cost mitigating approach to advanced lithography. Compared to DPL, DEL offers advantages in overlay and process time, thus reducing the cost-of-ownership (CoO) [4][5] . However, DEL requires new materials that have a non-linear photoresponse. So far, several approaches were proposed for double exposure lithography, from which Optical Threshold Layer (OTL) was found to give the best lithography performance according to the results of the simulation [4][5] . This paper details the principle of the OTL approach. A photochromic polymer was designed and synthesized. The feasibility of the material for application of DEL was explored by a series of evaluations.

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Efficient fully functionalized photorefractive polymethacrylates with infrared sensitivity and different spacer lengths

Cited by 32 publications

References 25 publications

Photorefractive polymer composite operating at the optical communication wavelength of 1550 nm

Photorefractive polymer composite operating at the optical communication wavelength of 1550 nm

Molecular design of photorefractive polymers

Fundamental study of optical threshold layer approach towards double exposure lithography

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