2020
DOI: 10.1021/acsami.9b20844
|View full text |Cite
|
Sign up to set email alerts
|

Efficient Spin–Orbit Torque Switching with Nonepitaxial Chalcogenide Heterostructures

Abstract: The spin-orbit torques (SOTs) generated from topological insulators (TIs) have gained increasing attention in recent years. These TIs, which are typically formed by epitaxially grown chalcogenides, possess extremely high SOT efficiencies and have great potential to be employed in the next-generation spintronics devices. However, epitaxy of these chalcogenides is required to ensure the existence of topologically-protected surface state (TSS), which limits the feasibility of using these materials in industry. In… Show more

Help me understand this report
View preprint versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
18
0

Year Published

2020
2020
2023
2023

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 33 publications
(18 citation statements)
references
References 39 publications
0
18
0
Order By: Relevance
“…Thus, it is crucial to investigate the SOT performance of non-epitaxial TI thin films on Si/SiO 2 wafers. Recently, there are attempts to deposit and evaluate the performance of non-epitaxial Bi x Se 1-x and Bi x Te 1-x thin films by sputtering on Si/SiO 2 substrates, which show promising results 26,27 . In particular, Bi x Se 1-x shows a very large θ SH = 8.7-18.6 but with the expense of reduced electrical conductivity (~ 7.8 × 10 3 Ω −1 m −1 ) comparing with epitaxial Bi 2 Se 3 (~ 5.7 × 10 4 Ω −1 m −1 ).…”
mentioning
confidence: 99%
“…Thus, it is crucial to investigate the SOT performance of non-epitaxial TI thin films on Si/SiO 2 wafers. Recently, there are attempts to deposit and evaluate the performance of non-epitaxial Bi x Se 1-x and Bi x Te 1-x thin films by sputtering on Si/SiO 2 substrates, which show promising results 26,27 . In particular, Bi x Se 1-x shows a very large θ SH = 8.7-18.6 but with the expense of reduced electrical conductivity (~ 7.8 × 10 3 Ω −1 m −1 ) comparing with epitaxial Bi 2 Se 3 (~ 5.7 × 10 4 Ω −1 m −1 ).…”
mentioning
confidence: 99%
“…( 2 ), respectively. Figure 7 d shows the relationship between the extracted values of H DL and J YPtBi for sample F. From the slope H DL / J YPtBi , M S = 443 emu/cc and t CoPt = 1.3 nm, we obtain = 4.1 for sample F, which is not only 2.6 times larger than that in sample E but also larger than that of several conventional TIs such as Bi 2 Se 3 , (BiSb) 2 Te 3 , and Bi x Te 1-x 9 , 10 , 12 . Note that, the improvement factor of 2.6 cannot be explained only by the elimination of spin dissipation in the Pt interfacial layer, which is given by = 0.78, where t Pt and of 1.1 nm are thickness and spin diffusion length for Pt, respectively.…”
Section: Further Improvement Of Spin Hall Anglementioning
confidence: 68%
“…On the hand, TIs with topological surface states (TSS), such as Bi 2 Se 3 , (Bi,Sb)Te 3 , and BiSb, have demonstrated very high θ SH larger than 1 at room temperature in epitaxial TI thin films prepared by molecular beam epitaxy 9 11 . Moreover, the high θ SH is maintained even in non-epitaxial TIs prepared by the industry-friendly sputtering technique 12 – 15 . Thus, TIs are very promising for magnetization manipulation with ultralow power consumption, and considered as the second-generation of spin Hall materials.…”
Section: Introductionmentioning
confidence: 99%
“…Similarly, interfacial PMA magnetic layer and efficient SOT switching have been obtained in Bi x Te 1− x /Pt/Co/Pt, Bi 2 Se 3 /Co/Pt. [ 169 , 170 ]…”
Section: Spin‐orbit Torque‐induced Magnetization Switching With Low Critical Current Densitymentioning
confidence: 99%