The use of tris(biphenyl-4-yl)silyl (TBPS) as a large protecting group for polyynes has been investigated. The basic building block, TBPS-CϵC-TMS (1), is synthesized in a new "one-pot" reaction through the sequential addition of lithiated nucleophiles to tetrachlorosilane. The TMS group of differentially protected 1 and the diyne 5 can be selectively removed in the presence of the TBPS group under mild conditions, allowing for the formation of TBPS-endcapped di-