Elastic electron backscattering from surfaces with overlayers

Jabłoński, A.; Hansen, Henrik Steen; Jansson, C.; Tougaard, S.

doi:10.1103/physrevb.45.3694

Cited by 59 publications

(25 citation statements)

References 24 publications

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“…EPES has also been used for: studies of systems consisting of an overlayer deposited on a substrate; 6,7 hydrogen detection on the surface; 8 surface composition of alloys; 9 examining growth modes of ultrathin gold films deposited on nickel 10 or on Al and alumina; 11 and the studies of surfaces with overlayers. 12,13 It has been shown that there is good accordance between experimentally obtained parameters describing elastic backscattering and theoretical predictions. 11 -23 However, few MC simulations have been applied for evaluating the elastic reflection intensity for a complex sample.…”

Section: Introductionsupporting

confidence: 62%

Experimental and model study of the Rh/Al system by means of EPES

Pavluch

Zommer

Polyak

et al. 2005

Surface & Interface Analysis

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The Rh/Al system has drawn significant attention as a model heterogeneous catalyst due to its unique adsorption properties. In this study, a set of samples consisting of Al substrates made of polished and etched pure metal sheets and deposited in situ with ultrathin Rh overlayers of different thickness was prepared. During the preparation of the samples, in-depth diffusion of Rh into the surface region of Al substrates obviously took place. To quantify this process, i.e. by non-destructively ascertaining the resulting depth profile of the samples, elastic peak electron spectroscopy (EPES) was employed. An EPES measurement was performed for energies of 500, 750 and 1000 eV with the initial Rh overlayer thickness in the range 3-20Å and using pure Rh and Al standards. The measurement was carried out on a precision spherical retarding-field analyser (RFA). The resulting experimental EPES intensities, as a function of the primary energy and the initial thickness of the Rh overlayer, were compared and fitted with the intensities simulated by the Monte Carlo (MC) method. An MC model of the sample surface consisting of three regions of different inelastic mean free path (IMFP) and Rh concentration were assumed: the first -Rh on the substrate top, the second -Rh/Al with exponential decay of Rh in Al and the third -pure Al. The best fit and best consistency for different primary energies were achieved under the assumption that no Rh was left on Al substrate top, but an exponentially decaying profile of Rh in Al was created at the surface.

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Section: Introductionsupporting

confidence: 62%

Experimental and model study of the Rh/Al system by means of EPES

Pavluch

Zommer

Polyak

et al. 2005

Surface & Interface Analysis

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“…In this report the Monte Carlo method was used to evaluate the photoelectron yields in a narrow and the 2π solid angles for Al, Cu, Ag, W and Pt targets and Ti 2s, Mn 2p3/ 2 , Al 2p, Au 4f7/ 2 photoelectron lines corresponding to the electron initial energies of 689, 613, 1169 and 1180 eV respectively. Detailed description of the Monte Carlo procedure may be found elsewhere [9]. In Fig.…”

Section: Comparison Of Analytical and Monte Carlo Simulation Resultsmentioning

confidence: 99%

Signal Photoelectron Yield Dependence on the X-Ray Angle of Incidence

1994

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The photoelectron emission from solids irradiated by X-rays was described by the analytical theory of electron transport and simulated by the Monte Carlo technique. The medium energy electron transport problem is treated by means of a Boltzmann type kinetic equation satisfying appropriate boundary conditions. The solution of the transport equation was obtained in the transport approximation based on the generalized radiative field similarity principle. Simple and reliable formalism was derived for both the differential and the total photoelectron yields. The dependence of the photoelectron yield on the X-ray incidence angłe and the "flattening" effect of multiple ełastic scattering on the angular distribution of electrons leaving the target are analysed in detail. The photoelectron yields and angular distributions calculated by the Monte Carlo algorithm, based on a realistic differential elastic scattering cross-section, are in good agreement with the results found from analytical theory. It is shown that main characteristics of the photoełectron emission are determined primarily by two parameters: the inelastic and the transport mean free paths.

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“…Furthermore, the constant-Ó energy approximation was used : the cross-sections for elastic and inelastic scattering were calculated for the initial energy only ; they were not updated during the slowing down of the electrons. The inelastic mean free path, ji, for 1000 eV electrons in Ag is 14 …”

Section: Model Simulationsmentioning

confidence: 99%

Trajectory Weighting: a Fast Monte Carlo Method for Calculating Large Numbers of XPS/AES Spectra

Alkemade

1997

Surf. Interface Anal.

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Elastic electron backscattering from surfaces with overlayers

Cited by 59 publications

References 24 publications

Experimental and model study of the Rh/Al system by means of EPES

Experimental and model study of the Rh/Al system by means of EPES

Signal Photoelectron Yield Dependence on the X-Ray Angle of Incidence

Trajectory Weighting: a Fast Monte Carlo Method for Calculating Large Numbers of XPS/AES Spectra

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