Abstract:Elastic properties of [InAs/AlSb] heterostructures coherently grown on a (001) InAs substrate are investigated by the density functional theory and compared to the prediction of the linear elasticity theory. The stress-strain curves of the four involved binaries (InAs, AlAs, AlSb, and InSb) are first studied: a significant deviation to the linear elasticity theory is observed for strain above 2.5% (in absolute value). Nevertheless, the relationship between the out-of-plane and in-plane strains is in a good agr… Show more
“…Later in 2016, Claveau et al from A. Ponchet's group studied the InAs/AlSb interface elastic strain properties using Density Functional Theory (DFT). Their calculations of strain via DFT agreed with the prediction of structures with predominately Al-As interfaces [45].…”
Section: Strain In Inas/alsb Multilayer Structuressupporting
confidence: 66%
“…Al-As bonds were suspected to be the primary cause of interfacial strains in InAs/AlSb heterostructures [5][6][7] [45]. Excess As at the interfaces may cause Al-As bonds outnumber In-Sb bonds.…”
Section: First-stage Mock Recipe Executions -As Flux Bypass the As Shmentioning
I hereby declare that I am the sole author of this thesis. This is a true copy of the thesis, including any required final revisions, as accepted by my examiners. I understand that my thesis may be made electronically available to the public.
“…Later in 2016, Claveau et al from A. Ponchet's group studied the InAs/AlSb interface elastic strain properties using Density Functional Theory (DFT). Their calculations of strain via DFT agreed with the prediction of structures with predominately Al-As interfaces [45].…”
Section: Strain In Inas/alsb Multilayer Structuressupporting
confidence: 66%
“…Al-As bonds were suspected to be the primary cause of interfacial strains in InAs/AlSb heterostructures [5][6][7] [45]. Excess As at the interfaces may cause Al-As bonds outnumber In-Sb bonds.…”
Section: First-stage Mock Recipe Executions -As Flux Bypass the As Shmentioning
I hereby declare that I am the sole author of this thesis. This is a true copy of the thesis, including any required final revisions, as accepted by my examiners. I understand that my thesis may be made electronically available to the public.
“…nAs/AlSb high-electron-mobility transistors (HEMTs) are strong candidates for applications in low-power highspeed radio-frequency circuits, 1,2) by virtue of their high electron velocity (4 × 10 7 cm s −1 ) and high electron mobility (30000 cm 2 V −1 s −1 at 300 K). 3,4) In addition, a big conduction band offset between InAs and AlSb (ΔE c = 1.35 eV) provides deeper quantum wells available for any other latticematched III-V heterostructure.…”
Band alignments between atomic layer deposition (ALD) HfO2/Al2O3 double layers and InAlAs were investigated by angle-resolved X-ray photoelectron spectroscopy (AR-XPS). The relationship of As and Hf 4f peaks reducing with the decreasing take-off angle θ indicated upward band bending on the InAlAs surface and a potential gradient in the HfO2/Al2O3 layer. AR-XPS measurements were combined with numerical calculations. The valence band and conduction band discontinuity between HfO2/Al2O3 and InAlAs were 2.49 ± 0.2 eV and 1.86 ± 0.2 eV, respectively. A low leakage current density of 7.01 × 10−7 A cm−2 at 1 V and oxide trapped charge densities of 9.925 × 1011 cm−2 were obtained.
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