2009
DOI: 10.1063/1.3272268
|View full text |Cite
|
Sign up to set email alerts
|

Electric breakdown in ultrathin MgO tunnel barrier junctions for spin-transfer torque switching

Abstract: Magnetic tunnel junctions for spin-transfer torque switching were prepared to investigate the dielectric breakdown. The breakdown occurs typically at voltages not much higher than the switching voltages, a bottleneck for the implementation of spin-transfer torque Magnetic Random Access Memory. Intact and broken tunnel junctions are characterized by transport measurements and then prepared for transmission electron microscopy and energy dispersive x-ray spectrometry by focussed ion beam. The comparison to our p… Show more

Help me understand this report
View preprint versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
14
0
1

Year Published

2015
2015
2022
2022

Publication Types

Select...
3
3
1

Relationship

0
7

Authors

Journals

citations
Cited by 30 publications
(15 citation statements)
references
References 19 publications
0
14
0
1
Order By: Relevance
“…[24,25] Recently, it was proposed that graphene could serve as a low-resistance tunnel barrier for vertical SV consisting of ferromagnet/graphene/ferromagnet junctions due to its features of single atomic layer thickness, zero-bandgap, and large area growth without pinholes. [24,25] Recently, it was proposed that graphene could serve as a low-resistance tunnel barrier for vertical SV consisting of ferromagnet/graphene/ferromagnet junctions due to its features of single atomic layer thickness, zero-bandgap, and large area growth without pinholes.…”
mentioning
confidence: 99%
“…[24,25] Recently, it was proposed that graphene could serve as a low-resistance tunnel barrier for vertical SV consisting of ferromagnet/graphene/ferromagnet junctions due to its features of single atomic layer thickness, zero-bandgap, and large area growth without pinholes. [24,25] Recently, it was proposed that graphene could serve as a low-resistance tunnel barrier for vertical SV consisting of ferromagnet/graphene/ferromagnet junctions due to its features of single atomic layer thickness, zero-bandgap, and large area growth without pinholes.…”
mentioning
confidence: 99%
“…We swept the voltage from zero to −600 to 600 mV and back to zero. Voltages of more than 600 mV led to a dielectric breakdown of the junctions (Thomas et al, 2008 ; Schaefers et al, 2009 ). All measurements are done with the bottom electrode as the reference potential.…”
Section: Resultsmentioning
confidence: 99%
“…These values are close to the dielectric breakdown voltage of the devices. Transmission electron microscopy images of MgO junctions before and after the dielectric breakdown are presented in our previous work (Thomas et al, 2008 ; Schaefers et al, 2009 ). Consequently, the investigations utilizing sequences of voltage pulses were limited to a maximum voltage of 500 mV.…”
Section: Methodsmentioning
confidence: 98%
See 1 more Smart Citation
“…Because the TMR effect measured in the fabricated device reached 100%, a higher sensitivity is also expected [10]. In case of TMR device, the maximum voltage applied to the tunneling barrier cannot exceed 1.5 V, because of a possibility of the electrical breakdown [11]. The input power in this case was, therefore, limited to in = -10 dBm, which resulted in TMR = 1.1 W. At resonance condition (test frequency 1.6 GHz and external magnetic field H = 600 Oe) the output power reached 45 W and sensitivity was calculated to 86 V/W.…”
Section: Tmrmentioning
confidence: 95%