2016
DOI: 10.1103/physrevb.93.205433
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Electric dipole spin resonance in systems with a valley-dependentgfactor

Abstract: In this theoretical study we qualitatively and quantitatively investigate the electric dipole spin resonance (EDSR) in a single Si/SiGe quantum dot in the presence of a magnetic field gradient, e.g., produced by a ferromagnet. We model a situation in which the control of electron spin states is achieved by applying an oscillatory electric field, inducing real-space oscillations of the electron inside the quantum dot. One of the goals of our study is to present a microscopic theory of valley dependent g-factors… Show more

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Cited by 15 publications
(11 citation statements)
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“…We argue that these new interface SOC contributions are much stronger than possible bulk contributions. Compared to previous phenomenological approaches 7,8,10,24,26,51,52,[65][66][67][68][69] , the approach taken in this paper provides more rigorous ground for analyzing current and future experiments.…”
Section: Summary and Discussionmentioning
confidence: 99%
“…We argue that these new interface SOC contributions are much stronger than possible bulk contributions. Compared to previous phenomenological approaches 7,8,10,24,26,51,52,[65][66][67][68][69] , the approach taken in this paper provides more rigorous ground for analyzing current and future experiments.…”
Section: Summary and Discussionmentioning
confidence: 99%
“…Applying strain raises four of the six valleys in energy such that there exists in silicon QDs an additional two-fold valley degeneracy which has the properties of a pseudo-spin [83]. This two-fold valley degeneracy can be lifted by interfaces in the 2DEG, however, the exact orientation and splitting of the valley depends on atomistic steps of the interface [321,322,323,324,325,326,327,328,329]. This makes the valley splitting very unpredictable, and it is unwanted in qubit implementations in silicon as it boosts up the already large Hilbert space of threespin qubits.…”
Section: Perspectivesmentioning
confidence: 99%
“…[ 48 ] Fortunately, recent experiment indicated that by using the silicon metal‐oxide‐semiconductor (Si‐MOS) platform the valley splitting can be as high as 0.8 meV. [ 49,50 ] In this way, the valley effect can also be safely neglected. According to the latest experiment, the relaxation time based on silicon platform has reached T1=9s.…”
Section: Resultsmentioning
confidence: 99%