2012
DOI: 10.1007/s40009-012-0060-8
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Electrical and Optical Characterization of Electron Beam Evaporated Indium Antimonide Thin Films

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Cited by 4 publications
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“…Another way to form InSb films is the three-temperature method (Gulyaev and Shitnikov, 2015). In addition, InSb films are formed by electron beam evaporation (Ivanov and Smirnov, 2015;Rahul et al, 2011).…”
Section: Introductionmentioning
confidence: 99%
“…Another way to form InSb films is the three-temperature method (Gulyaev and Shitnikov, 2015). In addition, InSb films are formed by electron beam evaporation (Ivanov and Smirnov, 2015;Rahul et al, 2011).…”
Section: Introductionmentioning
confidence: 99%
“…Electron beam evaporation (EBPVD) is also used to produce InSb films. The EBPVD-deposition of InSb films on glass substrate at temperature of 30 -100 °C with a thickness of 300 -400 nm and its structural state and electrical properties is discussed in (Rahul et al, 2011). In particular, on the base of X-ray diffraction (XRD) studies the authors found that the resulting films have a polycrystalline structure and are oriented along the planes ( 111) and (220).…”
Section: Introductionmentioning
confidence: 99%