2003
DOI: 10.1016/s0022-0248(02)01907-3
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Electrical and optical properties of ZnO transparent conducting films by the sol–gel method

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Cited by 612 publications
(244 citation statements)
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“…The appropriate annealing temperature to achieve the smallest resistivity was 400 ºC, which may have relationship with a high amount of oxygen vacancies. Thus, the favorable oriented growth along (002) plane of ZnO films prepared at T anneal = 600 ºC is not related with low resistivity as suggested in the literature 15,19,29 . The film porosity might adversely influence the light and conductivity phenomena to hinder the positive effect of (002) preferential orientation in ZnO films.…”
Section: Resultsmentioning
confidence: 66%
See 1 more Smart Citation
“…The appropriate annealing temperature to achieve the smallest resistivity was 400 ºC, which may have relationship with a high amount of oxygen vacancies. Thus, the favorable oriented growth along (002) plane of ZnO films prepared at T anneal = 600 ºC is not related with low resistivity as suggested in the literature 15,19,29 . The film porosity might adversely influence the light and conductivity phenomena to hinder the positive effect of (002) preferential orientation in ZnO films.…”
Section: Resultsmentioning
confidence: 66%
“…Transparent and conductive (002)-oriented ZnO films have been prepared by sol-gel spin-coating, however, the use of single crystal substrates and doping elements have been required [15][16][17] . In addition, undoped and (002)-oriented ZnO films grown on amorphous substrates by sol-gel have also been reported to show relatively attractive electrical and optical properties 18,19 . In this study, it is shown that the (002)-orientation is not the significant feature to achieve low resistivity in ZnO films prepared by sol-gel spin-coating on amorphous substrates.…”
Section: Introductionmentioning
confidence: 99%
“…Many techniques have been utilized to prepare ZnO thin films, such as metal organic chemical vapor deposition, pulsed laser deposition, sputtering, hydrothermal, sol-gel method, etc. [8][9][10][11][12][13][14][15][16][17][18]. Due to the low cost and simple equipment, sol-gel method has been extensively applied to prepare ZnO thin films.…”
Section: Introductionmentioning
confidence: 99%
“…The resistivity of the films was sharply decreased after thermal treatments. This was an expected result mainly due to the increase of grain size and of structural homogeneity and to the reduction of scattering of carriers at the grain boundaries with annealing temperature but can also be connected to the decrease of excess oxygen and/or to the increase of oxygen vacancies (which in turn leads to an increase of the carrier concentration) [28,29]. Additionally, the dopants depletion from the SnO 2 lattice and subsequent clusterization at the grain boundaries can also contribute for decreasing the resistivity of the film since the ionic metals can act as trapping centers.…”
Section: Electrical Propertiesmentioning
confidence: 95%