1993
DOI: 10.1016/0040-6090(93)90368-y
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Electrical and optical studies in some Bi doped amorphous chalcogenide thin films

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Cited by 28 publications
(22 citation statements)
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“…The electrical resistance was measured as a function of temperature and was calculated according to equation: r dc = l/RWd, where R is the resistance of the sample, d is the sample thickness, l is the spacing between the two electrodes and W is the width of the film. It is observed that the dc conductivity r dc exhibits an activated behaviour in the investigated sample in accordance with the well-known Arrhenius's equation [16,17]:…”
Section: Resultsmentioning
confidence: 55%
“…The electrical resistance was measured as a function of temperature and was calculated according to equation: r dc = l/RWd, where R is the resistance of the sample, d is the sample thickness, l is the spacing between the two electrodes and W is the width of the film. It is observed that the dc conductivity r dc exhibits an activated behaviour in the investigated sample in accordance with the well-known Arrhenius's equation [16,17]:…”
Section: Resultsmentioning
confidence: 55%
“…Different authors [27][28][29] have suggested different values of m for different glasses. The usual method for determining the values of E opt involves plotting a graph of (αhν) 1/m vs. hν.…”
Section: Energy Band Gapsmentioning
confidence: 99%
“…The E A values of 0.7-0.8 eV, characteristic of the unimplanted GeTe films, sharply decrease to 0.2-0.25 eV after implantation of Bi at doses of 5x10 15 ions.cm -2 and 2x10 16 ions.cm -2 [cf. (and () in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…100 nm thick Ge-Sb-Te, GeTe, and Ga-La-S films were prepared by rf sputtering, either on silicon to form heterojunction devices, or on fused silica substrates to probe the conductivity type by means of thermopower measurements. Ion implantation of bismuth was done in a Danfysik ion implanter with ion doses in the range of 1x10 14 -2x10 16 Compositional characterization of Ga-La-S film undertaken previously confirmed that the films were Ga 26 La 12 S 45 O 17 . GeTe films were sputtered from a target of a composition equal to 1:1.…”
Section: Methodsmentioning
confidence: 99%
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