2011
DOI: 10.1134/s1063782611070037
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Electrical and photoelectric properties of nanostructures obtained by electroless etching of silicon

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Cited by 4 publications
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“…The technology of obtaining Al−SiMP−p + -Si−Al struc-tures was described earlier [3]. The samples were obtained at the same technological mode, but there can be minor fluctuations in technological factors, which probably lead to a more subtle influence on the structure of the layers [6]. A beam of γ-quantum of braking radiation of the betatron of Saratov State University was used to irradiate the obtained structures at maximum energy E γ max = 25 MeV.…”
mentioning
confidence: 99%
“…The technology of obtaining Al−SiMP−p + -Si−Al struc-tures was described earlier [3]. The samples were obtained at the same technological mode, but there can be minor fluctuations in technological factors, which probably lead to a more subtle influence on the structure of the layers [6]. A beam of γ-quantum of braking radiation of the betatron of Saratov State University was used to irradiate the obtained structures at maximum energy E γ max = 25 MeV.…”
mentioning
confidence: 99%