Electrical and structural properties of LiNbO3 films, grown by RF magnetron sputtering

Iyevlev, V.; Kostyuchenko, А. V.; Sumets, M.; Vakhtel, V.M.

doi:10.1007/s10854-011-0296-y

Cited by 19 publications

(12 citation statements)

References 12 publications

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“…Table 2 presents the concentration data of the basic elements in the films grown under condition 3. It follows from Table 2 that the elemental composition matches with the stoichiometric composition in the film's volume and is in a good agreement with our previous results [6] for the films grown under condition 1. Therefore, we can conclude, that elemental composition of the grown LiNbO 3 films does not depend upon the sputtering regimes for conditions 1-3 in Table 1.…”

Section: Resultssupporting

confidence: 90%

“…It has been demonstrated in the previous works [6,19], that substrate orientation does not affect properties of LiNbO 3 films formed on (001)Si and (111)Si plates due to the formation of a thin (5 nm) passivating SiO 2 layer. In order to investigate orienting substrate effects on the film properties during the RFMS process we used ftorfluogopite-(111)Ag epitaxial films heterostructures as substrates.…”

Section: The Substrate-type Effectmentioning

confidence: 95%

“…Method radiofrequency magnetron sputtering (RFMS) and ion beam sputtering (IBS) are also among the effective methods for forming of complex oxides while preserving the initial elemental composition. It has been demonstrated that RFMS method can be used effectively for growing thin LiNbO 3 films on different substrates [4][5][6]. Many authors emphasized that sputtering conditions such as substrate temperature, reactive gas composition and pressure affected films properties during the growth process [7][8][9].…”

Section: Introductionmentioning

confidence: 99%

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Sputtering condition effect on structure and properties of LiNbO3 films

Sumets

Kostyuchenko

Иевлев

et al. 2015

J Mater Sci: Mater Electron

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Polycrystalline LiNbO 3 films were grown on various substrates by the radio-frequency magnetron sputtering (RFMS) method and ion-beam sputtering (IBS) method at different sputtering conditions. Films formed on the substrates situated within erosion zone (plasma effect) manifested textured structure. When plasma effect became insignificant only LiNbO 3 films with random size orientation were formed during the RFMS process and IBS process with an increase in the size of the crystallites. Reactive gas pressure as part of plasma effect has a profound effect on the films' properties. When gas pressure was increased greatly, grain size declined two fold and the average surface roughness of the grown films doubled. At the higher gas pressure Li-poor phase LiNb 3 O 8 appeared along with LiNbO 3 during the growth process. As a result, the film texture disappeared. Single phase LiNbO 3 films with two-axes (epitaxial) texture are formed on (111)Ag epitaxial film during the RFMS process at the ion assisted conditions.

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Section: Resultssupporting

confidence: 90%

Section: The Substrate-type Effectmentioning

confidence: 95%

Section: Introductionmentioning

confidence: 99%

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Sputtering condition effect on structure and properties of LiNbO3 films

Sumets

Kostyuchenko

Иевлев

et al. 2015

J Mater Sci: Mater Electron

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“…These changes are attributed to several parameters like grain size, composition and defects [12][13][14]. There are different known approaches to synthesize undoped LiNbO3 nanocrystals using soft-chemistry [15], pulsed laser deposition [16,17], RF sputtering [18] and hydrothermal methods [19,20]. LiNbO3 is also studied in its heterojunction structure, photonic crystal and single phase thin film [21][22][23][24][25], and surface acoustic wave device (SAW) [26].…”

Section: Introductionmentioning

confidence: 99%

Enhancement of Lithium Niobate nanophotonic structures via spin-coating technique for optical waveguides application

et al. 2017

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Abstract. This work is dedicated to investigation of temperature effects in Lithium Niobate (LiNbO3) nanostructures. The LiNbO3 nanostructures were deposited on glass substrate by spincoating technique. LiNbO3 was set down at 3000 rpm for 30 sec and annealed from 100 to 600 o C. The structures were characterized and analyzed by scanning electron microscopy (SEM) and ultraviolet visible (UV-vis) spectrophotometer. The measured results have showed that by increasing annealing temperatures, the structures start to be more crystallized and be more homogenized until the optimum arrangement was achieved. Once this was accomplished, it's applicable for optical waveguides development. Eventually, it starts to be less crystallization and non-homogeneous. Energy gap was recorded to be at average value of 3.9 eV.

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“…Different methods are used for growing thin LiNbO 3 films in integrated electronics: sol-gel method [1], chemical vapor deposition from the vapor phase (CVD process) [2], as liquid-phase epitaxy [3]. The method of radio-frequency magnetron sputtering (RFMS) is among the effective methods for growing films of complex oxides such as LiNbO 3 , while preserving the initial elemental composition [4][5][6]. Creation of thin LiNbO 3 films with certain properties is a complex technological issue because of strong dependence of film properties on the sputtering conditions [7][8][9].…”

Section: Introductionmentioning

confidence: 99%

Influence of thermal annealing on structural properties and oxide charge of LiNbO3 films

Sumets

Kostyuchenko

Иевлев

et al. 2015

J Mater Sci: Mater Electron

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C-oriented polycrystalline lithium niobate (LiNbO 3 ) films have been deposited on Si substrate by the radio-frequency magnetron sputtering method in an Ar atmosphere and Ar ? O 2 gas mixture. All as-grown LiNbO 3 films manifested positive fixed oxide charge regardless of the sputtering conditions. Donor centers are formed in Si substrate because of diffusion of O 2 molecules during sputtering process. Thermal annealing (TA) of the deposited films leads to increase in the surface roughness and grain size as well as formation of LiNb 3 O 8 phase in the studied films. Also, TA resulting in the decline of positive oxide charge due to the diffusion of oxygen molecules into LiNbO 3 films from air and out-diffusion from Si substrate.

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Electrical and structural properties of LiNbO3 films, grown by RF magnetron sputtering

Cited by 19 publications

References 12 publications

Sputtering condition effect on structure and properties of LiNbO3 films

Sputtering condition effect on structure and properties of LiNbO3 films

Enhancement of Lithium Niobate nanophotonic structures via spin-coating technique for optical waveguides application

Influence of thermal annealing on structural properties and oxide charge of LiNbO3 films

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