1985
DOI: 10.1109/jssc.1985.1052311
|View full text |Cite
|
Sign up to set email alerts
|

Electrical Breakdown in Thin Gate and Tunneling Oxides

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

0
12
0

Year Published

2011
2011
2024
2024

Publication Types

Select...
4
4

Relationship

0
8

Authors

Journals

citations
Cited by 90 publications
(12 citation statements)
references
References 32 publications
0
12
0
Order By: Relevance
“…168 Analogous to other electrically insulating materials, SSE systems are expected to have a fundamental material limit at which electrical failure will occur. [169][170][171] This could be through dielectric breakdown, electric field concentration due to rapid metal depletion at the interface, 162 mechanical flow of metal within existing defects developing increasing pressure, 172,173 or otherwise. Aguesse et al have touched on key issues in a study on the origin of dendritic failure in Ga-doped LLZO; 34 highlighting the critical role of defects as a potential root cause for dendritic behavior and similarities to work in Na + systems exhibiting similar failure modes.…”
Section: The Opportunity Cost Of a LI Metal Anode-gravimetric Energy ...mentioning
confidence: 99%
“…168 Analogous to other electrically insulating materials, SSE systems are expected to have a fundamental material limit at which electrical failure will occur. [169][170][171] This could be through dielectric breakdown, electric field concentration due to rapid metal depletion at the interface, 162 mechanical flow of metal within existing defects developing increasing pressure, 172,173 or otherwise. Aguesse et al have touched on key issues in a study on the origin of dendritic failure in Ga-doped LLZO; 34 highlighting the critical role of defects as a potential root cause for dendritic behavior and similarities to work in Na + systems exhibiting similar failure modes.…”
Section: The Opportunity Cost Of a LI Metal Anode-gravimetric Energy ...mentioning
confidence: 99%
“…6(a), the slopes for damaged samples become steeper than that of the reference; that is, the electrontrapping rate for the damaged samples increases. The time course of leakage current is derived from the electrontrapping behavior 22,23) as…”
Section: Electron-trapping Rate Changes Induced By Pidmentioning
confidence: 99%
“…37) Once the electrontrapping rate is determined, the time-to-final breakdown can be predicted on the basis of the cumulative defect model. 23,31) One can implement this methodology in the interlayer dielectric reliability analysis and in the design of low-damage plasma processes.…”
Section: Electron-trapping Rate Changes Induced By Pidmentioning
confidence: 99%
See 1 more Smart Citation
“…Moreover, with the severe scaling of device dimensions towards nanoscale lengths, a method to measure the electrostatic force field in the nanometer range is needed. This would help in protecting it from the breakdown electric field limit [3] in the design of very large scale integrated (VLSI) circuits. 1 Author to whom any correspondence should be addressed.…”
Section: Introductionmentioning
confidence: 99%